A new field-effect transistor using an n + -GaAs/p + -InGaP/n-GaAs high-barrier camel-like gate and GaAs/InGaAs heterostructure-channel has been fabricated successfully and demonstrated. Experimentally, an ultra high gate-drain breakdown voltage of 52 V and a high drain-source operation voltage over 20 V with low leakage currents are obtained for a 1 j 100 ôm 2 device. Furthermore, the studied device also shows high breakdown behaviors at high temperature environment and good microwave characteristics. Therefore, based on these good characteristics, the studied device is suitable for high-breakdown, low-leakage and high-temperature applications.