1996
DOI: 10.1049/el:19961372
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High-breakdown voltage Al 0.66 In 0.34 As 0.85 Sb 0.15 /In 0.75 Ga 0.25 As/InPheterostructure field-effect transistors

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Cited by 23 publications
(14 citation statements)
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“…InAlAs/InGaAs high electron mobility transistors (HEMTs) on InP substrate have demonstrated excellent high frequency characteristics especially for low noise applications in the microwave and millimeter wave range [1,2]. On the other hand, to acquire such high performance devices on cheaper and less brittle GaAs substrates, the metamorphic buffer layers have been widely used [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…InAlAs/InGaAs high electron mobility transistors (HEMTs) on InP substrate have demonstrated excellent high frequency characteristics especially for low noise applications in the microwave and millimeter wave range [1,2]. On the other hand, to acquire such high performance devices on cheaper and less brittle GaAs substrates, the metamorphic buffer layers have been widely used [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, high-temperature electronic devices are required for aircraft, automotive, space, and other applications under harshly thermal environments [7], [8]. Many devices such as MESFET and HEMT with high-temperature operation capability have been studied and reported [7], [8].…”
Section: Introductionmentioning
confidence: 99%
“…Many devices such as MESFET and HEMT with high-temperature operation capability have been studied and reported [7], [8]. However, the studies of high-temperature characteristics of high-barrier camel-like gate FETs are rarely found.…”
Section: Introductionmentioning
confidence: 99%
“…For HFETs, the breakdown voltage can be enhanced by increasing the effective gate Schottky barrier height to improve carrier confinement [2,6]. On the other hand, the off-state breakdown is one of the major factors limiting the application of the power amplifier [7].…”
Section: Introductionmentioning
confidence: 99%
“…Device B is produced based on a camel-like FET structure [9]. Due to the use of n + -GaAs/p -InGaP/n-GaAs camel-like structure as the gate layer, the barrier height is higher than conventional Schottky gate layers [2,6]. This indeed enhances the breakdown characteristics.…”
Section: Introductionmentioning
confidence: 99%