2003
DOI: 10.1109/ted.2003.819248
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High breakdown voltage AlGaN-GaN power-HEMT design and high current density switching behavior

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Cited by 399 publications
(235 citation statements)
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“…Since HPAB is placed close to phonon source, this is local value at a site (e.g. drain-source channel in high-mobility electron transistors) [38,39].…”
Section: Resultsmentioning
confidence: 99%
“…Since HPAB is placed close to phonon source, this is local value at a site (e.g. drain-source channel in high-mobility electron transistors) [38,39].…”
Section: Resultsmentioning
confidence: 99%
“…AlGaN/GaN heterojunction field-effect transistors (HFETs) are great candidates for next generation power switching applications in various power electronics due to superior physical properties such as high mobility, high breakdown field, and high carrier concentration [1][2][3][4][5]. In order to fulfill the maximum power conversion efficiency of AlGaN/GaN based power devices, the parasitic effects such as parasitic inductance caused by interconnection between devices must be minimized [6].…”
Section: Introductionmentioning
confidence: 99%
“…Its excellent material properties deliver breakdown voltage and specific onresistance beyond the material limits of silicon and silicon carbide semiconductors [2,3]. In order to compete with the market-dominating Si-based power devices such as power junction MOSFETs and IGBTs, GaN-on-Si technology which enables low-cost fabrication and large-diameter wafer is a focus of intensive research and GaN power devices on silicon substrate are frequently reported for high power switching application [4][5][6]. GaN-based transistors have been intensively developed and are being commercialized in the area of high frequency applications over X-band.…”
Section: Introductionmentioning
confidence: 99%