High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films

Starostin, Sergey A.; Premkumar, Peter Antony; Creatore, M.; Vries, Hindrik de; Paffen, Roger M. J.; Sanden, M.C.M. van de

doi:10.1063/1.3310024

Cited by 60 publications

(62 citation statements)

References 18 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…[23] However, we have already shown that smooth inorganic silica-like as well as organic carbon-rich films can be deposited in a diffuse glow-like discharge operating in cost-efficient nitrogen-based gas mixtures, or, even, using air as the process gas. [25] A number of process parameters has a significant effect on the general properties of the PECVD synthesized barrier film such as chemical composition, morphology, film density and adhesion to the substrate. Some of these correlations were already discussed in selected publications from our group.…”

Section: Introductionmentioning

confidence: 99%

Towards Roll‐to‐Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process

Starostin

Creatore

Bouwstra

et al. 2014

Plasma Processes & Polymers

View full text Add to dashboard Cite

An atmospheric pressure dielectric barrier discharge (DBD) was applied for the deposition of silica-like moisture barrier films on polyethylene 2,6 naphthalate foil. The diffuse plasma was sustained between two cylindrical drum electrodes in N 2 /O 2 /Ar gas flow with the addition of tetraethyl orthosilicate. The chemical composition, morphology and water vapour transmission rate of the moisture permeation barrier layers were studied as a function of the dynamic deposition rate and substrate temperature. It was demonstrated that dense silica-like layers of 100 nm thick with a good permeation barrier of �1.8 � 10À 3 g � m À 2 � day (at 40 8C, 90% RH), corresponding to three orders of magnitude barrier improvement with respect to the pristine polymer, can be deposited in an atmospheric pressure process.

show abstract

Section: Introductionmentioning

confidence: 99%

Towards Roll‐to‐Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process

Starostin

Creatore

Bouwstra

et al. 2014

Plasma Processes & Polymers

View full text Add to dashboard Cite

show abstract

“…According to the fast imaging analysis, during the single current pulse, this transient discharge evolved from a 'Townsend-like' mode to a 'glow-like' mode for each half cycle of the electric field [11,12]. It was also demonstrated that application of such a diffuse discharge as a plasma source for the roll-to-roll AP-PECVD process in conjunction with organosilicon precursors results in high quality inorganic silica-like thin films, which can be deposited on thermally sensitive polymeric substrates [14][15][16]. In this process, the increased discharge power density allows the synthesis of silica-like films with improved microstructure, lower impurities level and excellent gas diffusion barrier properties [16,17].…”

mentioning

confidence: 96%

“…The properties of an atmospheric-pressure high-current diffuse DBD operating at 200 kHz frequency in low cost N 2 /O 2 / Ar gas mixtures were investigated in [11][12][13][14]. According to the fast imaging analysis, during the single current pulse, this transient discharge evolved from a 'Townsend-like' mode to a 'glow-like' mode for each half cycle of the electric field [11,12].…”

mentioning

confidence: 99%

Atmospheric-pressure diffuse dielectric barrier discharges in Ar/O₂gas mixture using 200 kHz/13.56 MHz dual frequency excitation

Liu

Starostin²,

Peeters

et al. 2018

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

IntroductionDevelopment of a large linear or volumetric source of diffuse non-thermal plasma at atmospheric pressure remains to be an essential challenge both from a scientific and a technological point of view. Such a source is required in various applications including plasma-assisted gas phase chemical conversion, surface modification and synthesis of high quality functional thin films [1][2][3][4]. The emerging atmospheric-pressure plasma enhanced chemical vapour deposition (AP-PECVD) technology can potentially achieve a considerable cost efficiency in comparison to the common low-pressure plasma methods, by the possibility of in-line production and by avoiding expensive large-footprint vacuum equipment [5]. One of the common ways to create a large area non-thermal plasma at atmospheric pressure is the dielectric barrier discharge (DBD) AbstractAtmospheric-pressure diffuse dielectric barrier discharges (DBDs) were obtained in Ar/O 2 gas mixture using dual-frequency (DF) excitation at 200 kHz low frequency (LF) and 13.56 MHz radio frequency (RF). The excitation dynamics and the plasma generation mechanism were studied by means of electrical characterization and phase resolved optical emission spectroscopy (PROES). The DF excitation results in a time-varying electric field which is determined by the total LF and RF gas voltage and the spatial ion distribution which only responds to the LF component. By tuning the amplitude ratio of the superimposed LF and RF signals, the effect of each frequency component on the DF discharge mechanism was analysed. The LF excitation results in a transient plasma with the formation of an electrode sheath and therefore a pronounced excitation near the substrate. The RF oscillation allows the electron trapping in the gas gap and helps to improve the plasma uniformity by contributing to the pre-ionization and by controlling the discharge development. The possibility of temporally modifying the electric field and thus the plasma generation mechanism in the DF discharge exhibits potential applications in plasma-assisted surface processing and plasma-assisted gas phase chemical conversion.

show abstract

“…7 The uniformity of the plasma and the high power density make this technology of high applied value in surface treatment as well as in thin film deposition, and excellent SiO 2 -like barrier layers on polymeric substrates have been achieved. 3,8,9 Distinct regimes of plasma-polymer interactions along the electrodes were identified with AFM and SEM, and it was concluded that during the film growth process a competition between deposition and etching exists. 10 It is well known that the deposition, or the polymerization process, is very complex as numerous intermediates such as ions and radicals are generated, which can interact with the polymer surface.…”

Section: Introductionmentioning

confidence: 99%

Infrared gas phase study on plasma-polymer interactions in high-current diffuse dielectric barrier discharge

Liu

Welzel

Starostin³

et al. 2017

Journal of Applied Physics

Self Cite

View full text Add to dashboard Cite

Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. Infrared gas phase study on plasma-polymer interactions in high-current diffuse dielectric barrier discharge A roll-to-roll high-current diffuse dielectric barrier discharge at atmospheric pressure was operated in air and Ar/N 2 /O 2 gas mixtures. The exhaust gas from the discharge was studied using a highresolution Fourier-transform infrared spectrometer in the range from 3000 to 750 cm À1 to unravel the plasma-polymer interactions. The absorption features of H x N y O z , CO x , and HCOOH (formic acid) were identified, and the relative densities were deduced by fitting the absorption bands of the detected molecules. Strong interactions between plasma and polymer (Polyethylene-2,6-naphthalate, or PEN) in precursor-free oxygen-containing gas mixtures were observed as evidenced by a high CO x production. The presence of HCOOH in the gas effluent, formed through plasmachemical synthesis of CO x , turns out to be a sensitive indicator for etching. By adding tetraethylorthosilicate precursor in the plasma, dramatic changes in the CO x production were measured, and two distinct deposition regimes were identified. At high precursor flows, a good agreement with the precursor combustion and the CO x production was observed, whereas at low precursor flows an etching-deposition regime transpires, and the CO x production is dominated by polymer etching. Published by AIP Publishing. [http://dx

show abstract

High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films

Cited by 60 publications

References 18 publications

Towards Roll‐to‐Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process

Towards Roll‐to‐Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process

Atmospheric-pressure diffuse dielectric barrier discharges in Ar/O₂gas mixture using 200 kHz/13.56 MHz dual frequency excitation

Infrared gas phase study on plasma-polymer interactions in high-current diffuse dielectric barrier discharge

Contact Info

Product

Resources

About

High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films

Cited by 60 publications

References 18 publications

Towards Roll‐to‐Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process

Towards Roll‐to‐Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process

Atmospheric-pressure diffuse dielectric barrier discharges in Ar/O2gas mixture using 200 kHz/13.56 MHz dual frequency excitation

Infrared gas phase study on plasma-polymer interactions in high-current diffuse dielectric barrier discharge

Contact Info

Product

Resources

About

Atmospheric-pressure diffuse dielectric barrier discharges in Ar/O₂gas mixture using 200 kHz/13.56 MHz dual frequency excitation