Symposium on VLSI Circuits 1997
DOI: 10.1109/vlsic.1997.623818
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High-density chain ferroelectric random-access memory (CFRAM)

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Cited by 9 publications
(4 citation statements)
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“…In this case, the current flows some ReRAM cells, then combined resistance can be measured. This architecture reduces the number of Source Lines (SL) and Bit Lines (BL) [14][15]. Then, each of these Lines can be manufactured thicker to suppress the resistance.…”
Section: Hdc and Language Classificationmentioning
confidence: 99%
See 1 more Smart Citation
“…In this case, the current flows some ReRAM cells, then combined resistance can be measured. This architecture reduces the number of Source Lines (SL) and Bit Lines (BL) [14][15]. Then, each of these Lines can be manufactured thicker to suppress the resistance.…”
Section: Hdc and Language Classificationmentioning
confidence: 99%
“…In addition, cell size is expected to be smaller. According to [14], the chain cell structure reduces the area per cell from 8F 2 to 4F 2 . We assume that a similar effect might be expected with ReRAM.…”
Section: Hdc and Language Classificationmentioning
confidence: 99%
“…The phase‐change elements are stacked upon selection transistors, and as a result the area of the memory cell can be reduced to 4F 2 (F: design rule), just as in the case of NAND flash memory, which offers a cost reduction compared to the conventional design. Such a chain structure was previously used in capacitor‐type memory (chain FeRAM [ferroelectric RAM] ) but Ref. was the first to use a chain structure for resistor‐type memory.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, chain PRAM has been newly proposed for achieving lower bit cost (fabrication cost of one bit) [3]. It adopts the chain structure [4] [5] which connects the parallel connection of a transistor and a PCM connected in series. In [3], this chain structure is fabricated in a horizontal plane (xy plane).…”
Section: Introductionmentioning
confidence: 99%