High Density Mastering Using Electron Beam

Kojima, Yoshiyuki; Kitahara, Hiroaki; Kasono, Osamu; Katsumura, Masahiro; Wada, Yuji

doi:10.1143/jjap.37.2137

Cited by 40 publications

(15 citation statements)

References 8 publications

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“…Since Hosaka et al have introduced an EB writing system with a field emission (FE) electron gun for very fine pattern writing, 2) nanometer sized pattern fabrications have almost been used by this type system, and have been applied to quantum device, optical and magnetic recording media. [3][4][5][6][7] The results were, however, very far from 1 trillion bits (Tb)/in. 2 recording.…”

mentioning

confidence: 82%

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm²Pitch Dot Arrays

et al. 2008

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We studied proximity effect in 30 keV electron beam (EB) drawing with calixarene resist for patterned media and quantum devices. Using about 15-nm-thick calixarene resist on Si substrate in conventional EB drawing system, the proximity effect has been studied by forming and observing 20-, 25-, 30-, and 40-nm-pitch resist dot arrays and measuring exposure dosage intensity distribution (EID) function. As a result, the proximity effect is negligible small due to comparing with some dot sizes in center, side and corner of 2 µm square with 25×25 nm2 pitch dot arrays. In addition, the proximity effect parameter η in EID function is less than 0.3. It is clear that the EB drawing and calixarene resist system is very suitable for forming ultrahigh packed dot arrays pattern. We demonstrated 20×20 nm2 pitch resist dot arrays (about 1.6 Tb/in.2) with a dot diameter of about 14 nm and the same size as everywhere in the pattern.

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confidence: 82%

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm²Pitch Dot Arrays

et al. 2008

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“…Electron-beam ͑e-beam͒ mastering ͑EBR͒ technology will be the only choice for efficiently fabricating nanoscale master patterns for both DTM and BPM. Since conventional EBR can not provide track and bit pitch resolution of better than 70 nm, [3][4][5][6][7] we have developed a rotary stage EBR tool for production use to fabricate master templates with track and bit pitches smaller than 70 nm. 8 To fabricate large areal dense groove and bit patterns on narrow pitch concentric circles with track and bit pitches in the sub-50-nm range, our EBR system provides the following three fundamental capabilities: ͑1͒ A new PC-controlled electron optical column ͑EOC͒ equipped with a precondenser lens that achieves ten times larger beam current at an equal beam spot size than that of a conventional EOC, making it possible to write ultrafine patterns at the largest possible current in the highest throughput available.…”

Section: Introductionmentioning

confidence: 99%

Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media

Miyazaki¹,

Hayashi²,

Kobayashi³

et al. 2008

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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To fabricate master templates of high-density patterned magnetic media, the authors developed a high-resolution and high-throughput rotary stage electron beam mastering system. They accomplished the fabrication of discrete track media groove patterns with 45nm track pitch, and also a dense bit array with both track and bit pitch of 35nm for bit patterned media under the conditions of a bit rate of 1.22MHz∕bit at 50kV acceleration voltage. The high resolution and high throughput are derived from using a continuous stage movement flyback lithography (CSFL) function. CSFL is enabled by differentiated capabilities, such as an electron optical column that achieves a large beam current at a small beam diameter, and a friction-driven slider stage that provides a highly accurate positioning capability and a dynamic focus correction feature and r-theta stage driving. The CSFL capability, working in conjunction with a blankingless beam shift lithography (BLSL), is very effective for fabricating various kinds of servo pattern elements, such as grooves and dots, grooves and right-angled grooves, grooves and half-pitch-shift dot arrays, and various pit length patterns, to construct effective servo patterns.

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“…Many investigations have successfully demonstrated fabrication of nano-structure and nano-device using electron beam process for fabrication of high-density disk (Matsui 1997;Kojima et al 1998). Fujimura et al (2006) developed an electron beam recorder (EBR) and a process for high-density optical disk mastering by adopting inductively coupled plasma reactive ion etching (ICPRIE).…”

Section: Introductionmentioning

confidence: 99%

Fabrication of optical disk mastering using electron beam and embossing process

Pan

Yang

et al. 2007

Opt Quant Electron

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For the requirement of higher storage capacity of an optical disk, it is a good choice to shorten pit length and linewidth. However, the conventional laser beam mastering is difficult to fabricate smaller pit length and linewidth because of the optical diffraction limit. In order to solve this problem, optical disk mastering using electron beam lithography is presented. The process parameters of the electron beam mastering such as beam current, constant linear stage velocity, developing time, and focus distance are discussed in this research. In the experiments, it was found that the focus distance is an important parameter to fabricate nano-linewidth. The experimental results reveal that the 10 µm variance in focus distance causes about 12% variation in linewidth. The photoresist with nano-pattern defined by eletron beam was transferred into metal Ni-Co (Nickel-Cobalt) mold by electroplating process. The Ni-Co mold with hardness larger than Vicker Hardness (Hv) 650 was developed. Then, with the Ni-Co mold, LIGA (German: Lithographie GaVanoformung Abformung) process was applied to replicate high-density optical disk. The Ni-Co mold is served as a master for hot embossing process to transfer the nano-pattern onto PMMA sheet. Since the feature size is in nano-meter range, the study presents an innovative demolding mechanism to demold the master from the PMMA sheet without damaging the nano-meter structure. A spiral nanogroove with 112 nm in linewidth and 80 nm in depth has been successfully fabricated about 50 Gbytes storage capacity.

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High Density Mastering Using Electron Beam

Cited by 40 publications

References 8 publications

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm²Pitch Dot Arrays

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm²Pitch Dot Arrays

Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media

Fabrication of optical disk mastering using electron beam and embossing process

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High Density Mastering Using Electron Beam

Cited by 40 publications

References 8 publications

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm2Pitch Dot Arrays

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm2Pitch Dot Arrays

Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media

Fabrication of optical disk mastering using electron beam and embossing process

Contact Info

Product

Resources

About

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm²Pitch Dot Arrays

Extremely Small Proximity Effect in 30 keV Electron Beam Drawing with Thin Calixarene Resist for 20×20 nm²Pitch Dot Arrays