2022
DOI: 10.1364/ao.461537
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High efficiency echelle gratings for the far ultraviolet

Abstract: Modern grating manufacturing techniques suffer from inherent issues that limit their peak efficiencies. The anisotropic etching of silicon facilitates the creation of custom gratings that have sharp and atomically smooth facets, directly addressing these issues. We describe work to fabricate and characterize etched silicon echelles optimized for the far ultraviolet (FUV; 90–180 nm) bandpass. We fabricate two echelles that have parameters similar to the mechanically ruled grating flown on the Colorado High-reso… Show more

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Cited by 7 publications
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References 23 publications
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