2018
DOI: 10.1364/ome.8.001378
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High-efficiency, high-power mid-infrared quantum cascade lasers [Invited]

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Cited by 68 publications
(31 citation statements)
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“…The observed compositional grading at the interface could either result from; (a) surface segregation at the growth front during the layer growth or growth pause between SL layers [10,11], and/or (b) solid-state diffusion during the growth of subsequent layers, due to continued annealing as the structure is grown. Based on the growth rates in Table 1, the growth of 40 stages within a typical QCL active region takes~6.42 hr (including the 5 s pause time in between each layer) [12]. Using the diffusivity determined for the thin-motif SL results in a 2 √ Dt diffusion distance of 1.8 nm for the first layer within the first stage of the active region, while the first layer in the 40th stage would exhibit a 2 √…”
Section: Extent Of Interfacial Mixing In the Thin-motif Samplementioning
confidence: 99%
“…The observed compositional grading at the interface could either result from; (a) surface segregation at the growth front during the layer growth or growth pause between SL layers [10,11], and/or (b) solid-state diffusion during the growth of subsequent layers, due to continued annealing as the structure is grown. Based on the growth rates in Table 1, the growth of 40 stages within a typical QCL active region takes~6.42 hr (including the 5 s pause time in between each layer) [12]. Using the diffusivity determined for the thin-motif SL results in a 2 √ Dt diffusion distance of 1.8 nm for the first layer within the first stage of the active region, while the first layer in the 40th stage would exhibit a 2 √…”
Section: Extent Of Interfacial Mixing In the Thin-motif Samplementioning
confidence: 99%
“…2, b) для исследованных образцов дает значения характеристической температуры стабильности порогового тока T 0 порядка 150 K, плотности порогового тока при нулевой температуре j 0 = 0.9 kA/cm 2 . Полученные значения T 0 типичны для конструкций активной области с высоким уровнем легирования инжектора [23,24]. На основе анализа ватт-амперных характеристик определены значения дифференциальной эффективности (Slope efficiency) для различных температур.…”
Section: результаты и их обсуждениеunclassified
“…Аппроксимация температурной зависимости дифференциальной эффективности на основе обратно-экспоненциальной зависимости (Slope efficiency = const • exp(−T /T 1 )) [25] позволила определить значение характеристической температуры T 1 , которая составила порядка 450 K. Типичные значения T 1 составляют порядка 300−330 К для случая применения конструкции активной области с высоким уровнем легирования инжектора [23,26,27]. Таким образом, полученные в ходе исследования высокие значения T 1 характеризуют малую величину паразитной токовой утечки, обусловленную надбарьерным выбросом носи-телей заряда в непрерывный спектр [23]. Также проведены исследования максимально достижимой выходной оптической мощности при температуре 78 K (рис.…”
Section: результаты и их обсуждениеunclassified
“…Although it is difficult to obtain the K parameter directly from experiment, the product DK is more readily measured and has been determined to be in the range of 0.6-1.2 nm 2 for InGaAs/InAlAs interfaces. 9,16,[21][22][23] Reference 21 quotes values of K ¼ 6 nm and D ¼ 0.17 nm for the InGaAs/InAlAs interface grown on a (100) InP substrate by MBE. Somewhat lower D ¼ 0.115 nm and larger K ¼ 10.0 nm are deduced from performance analysis of MOVPE grown QCLs.…”
mentioning
confidence: 99%
“…Somewhat lower D ¼ 0.115 nm and larger K ¼ 10.0 nm are deduced from performance analysis of MOVPE grown QCLs. 23 While Ref. 17 shows that the K parameter can be anything between 5.5 nm and 18.5 nm depending on the MBE growth temperature.…”
mentioning
confidence: 99%