High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths

Huang, Qiushi; Boer, M. de; Barreaux, J.L.P.; Meer, Robert van der; Louis, Eric; Bijkerk, F.

doi:10.1364/oe.22.019365

Cited by 10 publications

(8 citation statements)

References 17 publications

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“…In this case, the OoB radiation over a broad wavelength range will be diffracted to higher orders by the tapered facets and the XUV light is still reflected by the overall periodic multilayer. This method was demonstrated by Huang et al 162,163 The surface tapered structure can have various forms, e.g., blazed grating shapes or symmetric pyramids, in one (1D) or two dimensions (2D). It can be made with a single material which is reflective for the OoB radiation and transparent for XUV, or consists of the multilayer structure itself (Figure 15).…”

Section: Diffraction Pyramidsmentioning

confidence: 99%

“…The demonstrated multilayer pyramid structure showed almost the same UV suppression as the Si pyramids, and resulted in a high EUV efficiency of 64.7%. 163 It is worth noting that there is a common issue with the different multilayer composed grating structures that use the zeroth order reflection of XUV light. The XUV diffraction effects cannot be fully neglected if the source is partially coherent.…”

Section: Diffraction Pyramidsmentioning

confidence: 99%

“…In this case, part of the reflected XUV light will be distributed to the neighboring orders and the far field intensity distribution around the zeroth order has to be taken into account. 163 …”

Section: Diffraction Pyramidsmentioning

confidence: 99%

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Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

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Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

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Section: Diffraction Pyramidsmentioning

confidence: 99%

Section: Diffraction Pyramidsmentioning

confidence: 99%

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Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Huang

Медведев

Kruijs

et al. 2017

Applied Physics Reviews

Self Cite

View full text Add to dashboard Cite

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“…Besides absorptive filters that block wider spectral ranges, XUV monitoring and metrology is making use mainly of periodic multilayer mirrors for selective reflection [5][6][7][8][9][10][11] of a desired, narrowband wavelength interval. However, with periodic layers, the shape of the spectral transmission peak is fixed due to the periodicity of the layer stack.…”

Section: Introductionmentioning

confidence: 99%

Reflective aperiodic multilayer filters for metrology at XUV sources

et al. 2020

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We present a general method for designing XUV aperiodic multilayer mirrors that can mimic a given target spectrum, specifically, the spectral transmission of an XUV optical system. The method is based on minimizing a merit function and using fidelity parameters that quantify the matching of the multilayer reflectivity spectrum with that of the target spectrum. To assess the feasibility of fabricating such a system, we show how to reduce the layer-to-layer thickness variations throughout the aperiodic layer stack. We demonstrate the design method using an example of an EUV optical system composed of 12 identical Mo/Si multilayer mirrors having a reflectivity peak at 13.5 nm. We found that the target spectrum can be mimicked with high fidelity either with a single reflection at an aperiodic multilayer mirror combined with standard absorbing filters or, if required, with two subsequent reflections at a mimic mirror. These examples demonstrate the applicability for metrology at XUV sources, including spectrally proper source imaging. Because our approach is of general applicability, the process can be used to mimic any other narrowband, single-peaked target spectrum in the XUV region.

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“…The manipulation of XUV radiation is hindered by the complexity and inefficiency of available optics [13]. The limited efficiencies [14] of these narrowband optics have led to the use of hybrid lenses that combine diffraction and refraction [15,16], although their construction remains highly complex and expensive [17].…”

Section: Introductionmentioning

confidence: 99%

Optimised XUV holography using spatially shaped high harmonic beams

Treacher¹,

Lloyd²,

Wiegandt³

et al. 2019

Opt. Express

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We present a novel method for controlling the transverse positions and relative powers of multiple high-order harmonic beams. A phase-only spatial light modulator is used to produce multiple infrared foci, the positions and intensities of which can be controlled programmably, enabling the generation and control of multiple HHG beams. To demonstrate the utility of this method we perform Fourier transform holography with separate illumination of the object and reference pinhole by a pair of HHG beams, which makes optimal use of the available photon flux. The programmable control of the spatial distribution of HHG beams demonstrated here offers new opportunities for experiments at extreme ultraviolet (XUV) wavelengths, particularly for photon intensive applications such as imaging.

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High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths

Cited by 10 publications

References 17 publications

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

Reflective aperiodic multilayer filters for metrology at XUV sources

Optimised XUV holography using spatially shaped high harmonic beams

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