High-energy Electron Beam Lithography for Nanoscale Fabrication

Wu, Chao‐Chin; Makiuchi, Yoshiyuki; Chen, ChiiDong

doi:10.5772/8179

Cited by 8 publications

(7 citation statements)

References 20 publications

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“…This method enables the formation of complex polymer nanostructures of any shape with a minimum line width of 10 nm not only on semiconductor substrates, but also on conductive surfaces such as a Au thin film. A similar sub-20 nm resolution is possibly using state-of-the-art, high-energy e-beam lithography systems with a beam acceleration of 50–100 kV on positive and negative resists [19]. In the single-spot nanolithography, there are no limitations in the use of thin metal films such as Au, Pt, Al, Cu, Ti or Cr.…”

Section: Resultsmentioning

confidence: 99%

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

Samardak¹,

Anisimova²,

Samardak³

et al. 2015

Beilstein J. Nanotechnol.

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SummaryThe paper presents a method for the high-resolution production of polymer nanopatterns with controllable geometrical parameters by means of a single-spot electron-beam lithography technique. The essence of the method entails the overexposure of a positive-tone resist, spin-coated onto a substrate where nanoscale spots are exposed to an electron beam with a dose greater than 0.1 pC per dot. A single-spot enables the fabrication of a nanoring, while a chain of spots placed at distance of 5–30 nm from each other allows the production of a polymer pattern of complex geometry of sub-10 nm resolution. We demonstrate that in addition to the naturally oxidized silicon substrates, gold-coated substrates can also successfully be used for the single-spot nanopattering technique. An explanation of the results related to the resist overexposure was demonstrated using Monte Carlo simulations. Our nanofabrication method significantly accelerates (up to 10 times) the fabrication rate as compared to conventional lithography on positive-tone resist. This technique can be potentially employed in the electronics industry for the production of nanoprinted lithography molds, etching masks, nanoelectronics, nanophotonics, NEMS and MEMS devices.

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Section: Resultsmentioning

confidence: 99%

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

Samardak¹,

Anisimova²,

Samardak³

et al. 2015

Beilstein J. Nanotechnol.

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“…8 Electron beam lithography (EBL) is a flexible manufacturing technology that can be processed without a mask. 9 The atomic force microscope has nanometer resolution, straightforward operation, and a wide processing range. It can be processed in air and liquid environments.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of sinusoidal-shaped multi-tip diamond tools by a focused ion beam machining process

Yan

Wang

et al. 2022

Proceedings of the Institution of Mechanical Engineers, Part B:

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Multi-tip diamond (MTD) tools have remarkable advantages in scratching micro-nano structures. A key component of inertial confinement fusion is a glass capsule with a periodic sinusoidal ripple nanostructure, and its processing requires very low surface roughness and a consistent nanostructure. Using MTD tools for force servo machining is an efficient method, and the focused ion beam (FIB) method has been effective in machining multi-tip diamond tools. To machine an MTD tool with high precision and efficiency, experiments were conducted to explore the influence of FIB machining parameters on tip geometries. The tip of a MTD tool with a three-dimensional periodic sinusoidal ripple was successfully prepared using optimized processing parameters. The results demonstrated that the estimated amplitude and period machining error was less than 1.71% and 1.63%, respectively, for nanoscale structured tips. Related research provides a new solution for the cross-scale and efficient processing of nanostructures.

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“…High-energy (EBL) offers a range of advantages over low-energy systems, including proximity effect reduction, vertical resist sidewalls and dimension accuracy over rough surfaces [7,8]. Nanofabrication on insulating substrates using high energy EBL can be challenging due to several key factors.…”

Section: Introductionmentioning

confidence: 99%

“…Nanofabrication on insulating substrates using high energy EBL can be challenging due to several key factors. These include increased electron back scattering; insufficient charge dissipation; large area dose required for exposing conventional high resolution e-beam resists (such as poly(methyl methacrylate) (PMMA) / hydrogen silsesquioxane (HSQ) / ZEP-series) at high EBL acceleration voltages; and inevitably a large beam current in order to pattern with acceptable throughput [7][8][9][10][11][12][13][14][15][16]. Workarounds include depositing an ultra-thin metallic layer either above or below the resist or using a conductive polymer; both methods are used to dissipate the built-up charge during exposure [10,[17][18][19][20].…”

Section: Introductionmentioning

confidence: 99%

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Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography

Williams

Bartholomew²,

Rughoobur³

et al. 2016

Nanotechnology

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High-energy electron beam lithography for patterning nanostructures on insulating substrates can be challenging. For high resolution, conventional resists require large exposure doses and for reasonable throughput, using typical beam currents leads to charge dissipation problems. Here, we use UV1116 photoresist (Dow Chemical Company), designed for photolithographic technologies, with a relatively low area dose at a standard operating current (80 kV, 40-50 μC cm, 1 nAs) to pattern over large areas on commercially coated ITO-glass cover slips. The minimum linewidth fabricated was ∼33 nm with 80 nm spacing; for isolated structures, ∼45 nm structural width with 50 nm separation. Due to the low beam dose, and nA current, throughput is high. This work highlights the use of UV1116 photoresist as an alternative to conventional e-beam resists on insulating substrates. To evaluate suitability, we fabricate a range of transmissive optical devices, that could find application for customized wire-grid polarisers and spectral filters for imaging, which operate based on the excitation of surface plasmon polaritons in nanosized geometries, with arrays encompassing areas ∼0.25 cm.

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High-energy Electron Beam Lithography for Nanoscale Fabrication

Cited by 8 publications

References 20 publications

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

Fabrication of sinusoidal-shaped multi-tip diamond tools by a focused ion beam machining process

Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography

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