High energy implants of aluminum in Czochralski and floating zone grown silicon substrates

Ferla, A. La; Torrisi, L.; Galvagno, G.; Rimini, E.; Ciavola, G.; Camera, Adriana Simane; Gasparotto, A.

doi:10.1016/0168-583x(93)95024-y

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

customersupport@researchsolutions.com

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

High energy implants of aluminum in Czochralski and floating zone grown silicon substrates

Cited by 5 publications

References 7 publications

2 MeV aluminum implantation into silicon: radiation damage

2 MeV aluminum implantation into silicon: radiation damage

Trends in ion implantation technology of semiconductors

Oxidation induced precipitation in Al implanted epitaxial silicon

Contact Info

Product

Resources

About