High-field chemistry of organometallic precursors for direct-write of germanium and silicon nanostructures

Vasko, Stephanie E.; Jiang, Wenjun; Lai, Haoyu; Sadı́lek, Martin; Dunham, Scott T.; Rolandi, Marco

doi:10.1039/c2tc00393g

Cited by 4 publications

(4 citation statements)

References 58 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In the case of an air gap, the air molecules are rarefied underneath the probe tip, which resembles a vacuum barrier for electron tunneling. However, in the presence of precursor fluid the overall current is enhanced due to factors, such as the existence of generated charge carriers and the empty molecular orbitals of the precursors . Further away from the probe tip, drift and scattering of charge carriers are the main transport modes that manifest themselves as electrical resistivity.…”

Section: Resultsmentioning

confidence: 99%

“…However, in the presence of precursor fluid the overall current is enhanced due to factors, such as the existence of generated charge carriers and the empty molecular orbitals of the precursors. 37 Further away from the probe tip, drift and scattering of charge carriers are the main transport modes that manifest themselves as electrical resistivity. The measured I−V responses of a probe tip can be treated as an equivalent circuit consisting of a diode and a resistor as shown in Figure 3c.…”

Section: ■ Results and Discussionmentioning

confidence: 99%

See 1 more Smart Citation

Surfing Scanning Probe Nanolithography at Meters Per Second

Yao

Chen

et al. 2022

Nano Lett.

View full text Add to dashboard Cite

Scanning probe lithography (SPL) as a maskless approach with a low tool price can pattern a variety of materials at a nanometer or even atomic resolution. However, the throughput of conventional SPLs is extremely low due to their limited scanning speeds. Here, we report a high-speed, probe-based method to continuously pattern the substrate surface at a linear velocity of meters per second. We demonstrated direct writings of nanoscale patterns by using ultrafast electron-induced deposition inside a nanoscale flow at a patterning frequency of 20 MHz. The fast scan motion of the writing probe is precisely controlled by using self-adaptive hydro-and aerodynamics functions of a patterning head. The microscale electro-hydrodynamic ejection and microfluid channels are used to deliver the precursor at high scanning speeds. One patterning head can carry parallel probes to further enhance the patterning throughput. This low-cost, maskless patterning method opens new avenues to develop highthroughput nanomanufacturing techniques.

show abstract

Section: Resultsmentioning

confidence: 99%

Section: ■ Results and Discussionmentioning

confidence: 99%

Surfing Scanning Probe Nanolithography at Meters Per Second

Yao

Chen

et al. 2022

Nano Lett.

View full text Add to dashboard Cite

show abstract

“…A high‐resolution method related to FEBID is the decomposition of the precursor molecules by the tunneling current of a scanning tunneling microscope (STM). This approach enables fabrication of features smaller than 10 nm even on bulky substrates . However, we found only one report of a high‐aspect‐ratio metal structure fabricated in an STM, a 9 nm wide and 880 nm high fiber made of crystalline bcc iron …”

Section: Discussionmentioning

confidence: 99%

Additive Manufacturing of Metal Structures at the Micrometer Scale

et al. 2017

View full text Add to dashboard Cite

Currently, the focus of additive manufacturing (AM) is shifting from simple prototyping to actual production. One driving factor of this process is the ability of AM to build geometries that are not accessible by subtractive fabrication techniques. While these techniques often call for a geometry that is easiest to manufacture, AM enables the geometry required for best performance to be built by freeing the design process from restrictions imposed by traditional machining. At the micrometer scale, the design limitations of standard fabrication techniques are even more severe. Microscale AM thus holds great potential, as confirmed by the rapid success of commercial micro-stereolithography tools as an enabling technology for a broad range of scientific applications. For metals, however, there is still no established AM solution at small scales. To tackle the limited resolution of standard metal AM methods (a few tens of micrometers at best), various new techniques aimed at the micrometer scale and below are presently under development. Here, we review these recent efforts. Specifically, we feature the techniques of direct ink writing, electrohydrodynamic printing, laser-assisted electrophoretic deposition, laser-induced forward transfer, local electroplating methods, laser-induced photoreduction and focused electron or ion beam induced deposition. Although these methods have proven to facilitate the AM of metals with feature sizes in the range of 0.1-10 µm, they are still in a prototype stage and their potential is not fully explored yet. For instance, comprehensive studies of material availability and material properties are often lacking, yet compulsory for actual applications. We address these items while critically discussing and comparing the potential of current microscale metal AM techniques.

show abstract

“…Direct scanning probe writing by high field discharge technique [75,76] was used to write down local oxidized patterns at nanometric scale. During the writing processes, performed in contact mode at a defined set-point force below 10 nN, the tip scans the surface at constant speed (1 4 m/s) according to a pre-designed pattern.…”

Section: Hot Electrons Imagingmentioning

confidence: 99%

Novel Plasmonic Probes and Smart Superhydrophobic Devices, New Tools for Forthcoming Spectroscopies at the Nanoscale

Giugni

Torre

Allione

et al. 2014

NATO Science for Peace and Security Series B: Physics and Biophysics

View full text Add to dashboard Cite

In this work we review novel strategies and new physical effects to achieve compositional and structural recognition at single molecule level. This chapter is divided in two main parts. The first one introduces the strategies currently adopted to investigate matter at few molecules level. Exploiting the capability of surface plasmon polaritons to deliver optical excitation at nanoscale, we introduce a technique relying on a new transport phenomenon with chemical sensitivity and nanometer spatial resolution. The second part describes how micro and nanostructured superhydrofobic textures can concentrate and localize a small number of molecules into a well-defined region, even when only an extremely diluted solution is available. Several applications of these devices as micro- and nano-systems for high-resolution imaging techniques, cell cultures and tissue engineering applications are also discussed

show abstract

High-field chemistry of organometallic precursors for direct-write of germanium and silicon nanostructures

Cited by 4 publications

References 58 publications

Surfing Scanning Probe Nanolithography at Meters Per Second

Surfing Scanning Probe Nanolithography at Meters Per Second

Additive Manufacturing of Metal Structures at the Micrometer Scale

Novel Plasmonic Probes and Smart Superhydrophobic Devices, New Tools for Forthcoming Spectroscopies at the Nanoscale

Contact Info

Product

Resources

About