2012
DOI: 10.1016/j.sse.2011.07.010
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High-frequency, 6.2ÅpN heterojunction diodes

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Cited by 3 publications
(4 citation statements)
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“…It turns out that a low drain bias is helpful to get the highest maximum . This scaled gate series resistance shows much lower max at short channels and illustrates the importance of minimizing [20], which can be done in practice by adopting a T-gate architecture [50,51]. We find that max predicted by our model can go beyond 1 THz for channel lengths shorter than 50 nm.…”
Section: High Frequency Performancementioning
confidence: 66%
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“…It turns out that a low drain bias is helpful to get the highest maximum . This scaled gate series resistance shows much lower max at short channels and illustrates the importance of minimizing [20], which can be done in practice by adopting a T-gate architecture [50,51]. We find that max predicted by our model can go beyond 1 THz for channel lengths shorter than 50 nm.…”
Section: High Frequency Performancementioning
confidence: 66%
“…In figure 7 (a), , is represented for two (0.1 and 0.6 V). The dashed black lines represent , , which is the physical limit that no cutoff frequency could surpass for GFETs [20,31]. It comes out from the supposition that maximum group velocity achievable in graphene is the Fermi velocity , following the trend , ≈ (2 ) ⁄ .…”
Section: High Frequency Performancementioning
confidence: 99%
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“…El sistema dispersor consiste de un pozo de potencial 2D (capa de GaAs) entre dos barreras de potencial 2D (capa de Al 0 7 Ga 0 3 As) sujetos, tanto las barreras como el pozo, a una fuerza eléctrica longitudinal y a una fuerza eléctrica transversal, ambas aplicadas de manera externa. Se espera que éste sistema dispersor presente tunelaje resonante y al mismo tiempo que la fuerza eléctrica transversal acople canales.En particular, los dispositivos a base de tunelaje resonante son de considerable interes, ya que una gran variedad de aplicaciones pueden ser realizadas con gran éxito[5,6].Por todo lo mencionando anteriormente, consideramos necesario el estudio teórico del fenómeno del tunelaje resonante en heteroestructuras semiconductoras.…”
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