Special Issue Paper
110The AlGaN/GaN heterstrostructures with its intrinsic two-dimensional electron gas (2DEG) is a promising materials system for high speed, high power, and high temperature electronics. Recently, it has been shown that the electron mobility (µ) of the 2DEG can exceed 50,000 cm 2 /Vs at low temperatures. 1,2 Based on what is known about the 2DEG system in AlGaAs/GaAs heterostructures, growth morphology and interface roughness could have a dramatic impact on the transport properties of the 2DEG. 3 In the AlGaN/GaN system, due to the lack of suitable substrates, dislocations and their associated electronic states present additional factors that can affect surface morphology and 2DEG transport. 4 Hence, it is important to understand how surface morphology correlates with growth conditions and the 2DEG transport properties. Due to its sub-nanometer lateral and vertical resolution, scanning force microscopy (SFM) or atomic force microscopy has become an indispensable tool for surface characterization. For thin film growth, SFM images can be used to evaluate film quality, to distinguish between two-dimensional vs. three-dimensional (island) growth modes, and to discern the existence of defects such as grain boundaries and dislocations. Dislocation mediated surface Scanning force microscopy was used to examine the surfaces of AlGaN/GaN heterostructures grown by molecular beam epitaxy (MBE) on GaN templates prepared by hydride vapor phase epitaxy (HVPE). Away from dislocations, the MBE growth replicates the surface morphology of the HVPE film, with monolayer steps clearly visible in topographic images. However, the surface morphology near dislocations depends strongly on the MBE growth conditions. Under Ga rich growth the dislocations appear as hillocks, while under stoichiometric growth they appear as pits. A dependence on Al concentration is also observed. Surface contact potential variation near dislocations is consistent with excess negative charges surrounding by a depletion region, but this was observed only for the film grown under stoichiometric conditions.