2019
DOI: 10.1016/j.sse.2019.05.011
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High mobility solution processed MoS2 thin film transistors

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Cited by 20 publications
(16 citation statements)
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“…Post‐annealing treatment: annealing temperature provides energy to the NbS 2 atoms which facilitate the coalescence, resulting in the larger size of NbS 2 particles starts forming. As the temperature going to increase, new Nb‐S bonds have been created between adjacent particles and different recrystallized obtained, such effects were already reported in others TMDs 46,47 . After that evaporation was started from the top layers of NbS 2 flakes, Nb and S atoms are going to start and thinning of the individual particle leads.…”
Section: Mechanism Of Structural Changes By Post‐annealing and Plasmasupporting
confidence: 51%
See 1 more Smart Citation
“…Post‐annealing treatment: annealing temperature provides energy to the NbS 2 atoms which facilitate the coalescence, resulting in the larger size of NbS 2 particles starts forming. As the temperature going to increase, new Nb‐S bonds have been created between adjacent particles and different recrystallized obtained, such effects were already reported in others TMDs 46,47 . After that evaporation was started from the top layers of NbS 2 flakes, Nb and S atoms are going to start and thinning of the individual particle leads.…”
Section: Mechanism Of Structural Changes By Post‐annealing and Plasmasupporting
confidence: 51%
“…As the temperature going to increase, new Nb-S bonds have been created between adjacent particles and different recrystallized obtained, such effects were already reported in others TMDs. 46,47 After that evaporation was started from the top layers of NbS 2 flakes, Nb and S atoms are going to start and thinning of the individual particle leads. This thermal thinning of NbS 2 flakes can be understood by the layer-by-layer evaporation model, which assumes that the atoms were evaporated from the top surface at high temperatures.…”
Section: Mechanism Of Structural Changes By Post-annealing and Plasmentioning
confidence: 99%
“…The bottom-gate, top-contact configuration used in this work involves the deposition of the organic semiconductor layer prior to the evaporation of contact electrodes, which does not allow the utilization of PFBT treatment without damaging the active layer. Hexamethyldisilazane (HMDS) treatment [ 58 ] can also be applied to the substrate to passivate the hydrophilic silanol groups, which would otherwise serve as charge trap centers and undermine the electrical performance of the TIPS pentacene/PFS based OTFTs. Therefore, the mobility reported in this work can be significantly enhanced by utilizing and optimizing these factors as mentioned above.…”
Section: Resultsmentioning
confidence: 99%
“…However, this method needed a two-step thermolysis with an expensive sapphire substrate and was not totally applicable to large-area preparation. Another approach was to use a mixed solvent system to obtain MoS 2 layers by a solution process [7][8][9] , where a two-step annealing process and sulfurization or pulsed laser annealing were also required.…”
Section: Introductionmentioning
confidence: 99%