The direct epitaxial growth of III-V semiconductor lasers on standard,
CMOS-compatible, on-axis (001) Si substrates is actively sought for
the realization of active photonic integrated circuits. Here we report
on the first mid-infrared semiconductor laser epitaxially grown on
on-axis Si substrates, i.e., compatible with industry standards.
Furthermore, these GaSb-based laser diodes demonstrate low threshold
current density, low optical losses, high temperature operation, and
high characteristic temperatures. These results represent a
breakthrough toward the integration of semiconductor laser sources on
Si for smart sensors.