High-performance nanowire-grid polarizers

Wang, Jianjim; Zhang, Wei; Deng, Xuegong; Deng, Jiandong; Liu, Feng; Sciortino, P.F.; Chen, Lei

doi:10.1364/ol.30.000195

Cited by 81 publications

(44 citation statements)

References 8 publications

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“…Figure 3 (a) shows the corresponding optical microscope images (from yellow to cyan) of fifteen square-shaped plasmonic SCFs illuminated by TM-polarized white light. At the same time, these nanostructures strongly transmit TE-polarized light (Supplementary Figure S3), which distinctly contrasts with that of previous optically-thick plasmonic ACFs or wire-grid polarizers 3,30 . The polarization-dependent color filtering effects in plasmonic SCFs arise from the polarizationdependent excitation of SPPs in 1D Ag nanogratings.…”

Section: Resultscontrasting

confidence: 75%

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

2014

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Plasmonic color filters employing a single optically-thick nanostructured metal layer have recently generated considerable interest as an alternative to colorant-based color filtering technologies, due to their reliability, ease of fabrication, and high color tunability. However, their relatively low transmission efficiency (,30%) needs to be significantly improved for practical applications. The present work reports, for the first time, a novel plasmonic subtractive color filtering scheme that exploits the counter-intuitive phenomenon of extraordinary low transmission (ELT) through an ultrathin nanostructured metal film. This approach relies on a fundamentally different color filtering mechanism than that of existing plasmonic additive color filters, and achieves unusually high transmission efficiencies of 60 , 70% for simple architectures. Furthermore, owing to short-range interactions of surface plasmon polaritons at ELT resonances, our design offers high spatial resolution color filtering with compact pixel size close to the optical diffraction limit (,l/2), creating solid applications ranging from imaging sensors to color displays. N anopatterned ultrathin metal films are investigated for use as highly transmissive plasmonic subtractive color filter arrays with sub-micrometer spatial resolution. This represents an attractive approach for onchip color filters, which are vital components for future displays, image sensors, digital photography, projectors and other optical measurement instrumentation. Previous approaches based on traditional colorant filters employ organic dyes or chemical pigments that are vulnerable to processing chemicals, and undergo performance degradation under long-duration ultraviolet irradiation or at high temperatures. Furthermore, highly-accurate lithographic alignment techniques are required to pattern each type of pixel in a large-area array, significantly increasing fabrication complexity and cost. Plate-like dielectric deflectors have recently been proposed 1 , but this scheme suffers from intrinsic limitations due to poor color purity, since the deflector covers only half of the total area. Nanoplasmonic color filters have been proposed recently as a promising means of overcoming the above limitations [2][3][4][5][6][7][8][9][10][11] . The well-known extraordinary optical transmission (EOT) phenomenon 12-14 , observed in a single opticallythick metal film perforated with a periodic subwavelength hole array, has been extensively studied for additive color filtering (ACF) applications over the past decade. Such plasmonic color filters reject the entire visible spectrum except for selective transmission bands that are associated with the excitation of surface plasmon polaritons (SPPs) 2,6-14 . These EOT transmission bands can be spectrally tuned throughout the entire visible spectrum by simply adjusting geometric parameters, such as the periodicity, shape and size of nanoholes, leading to the high color tunability. Single-layer nanostructured metals also have significant advantage...

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Section: Resultscontrasting

confidence: 75%

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

2014

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“…Th e full-width at half maximum of the passbands is about 100 nm for all three colours. However, the devices strongly refl ect TE-polarized light, as in wire-grid polarizers 27 . Th erefore, the transmission of TE-polarized light is suppressed as shown in Figure 2b .…”

Section: Resultsmentioning

confidence: 99%

Plasmonic nanoresonators for high-resolution colour filtering and spectral imaging

et al. 2010

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Colour and spectral imaging systems typically use fi lters and glass prisms to disperse light of different wavelengths. With the miniaturization of integrated devices, current research on imaging sensors focuses on novel designs aiming at high effi ciency, low power consumption and slim dimension, which poses great challenges to the traditional colourant-based fi ltering and prismbased spectral splitting techniques. In this context, surface plasmon-based nanostructures are attractive due to their small dimensions and the ability to effi ciently manipulate light. In this article we use selective conversion between free-space waves and spatially confi ned modes in plasmonic nanoresonators formed by subwavelength metal -insulator -metal stack arrays to show that the transmission spectra through such arrays can be well controlled by using simple design rules, and high-effi ciency colour fi lters capable of transmitting arbitrary colours can be achieved. These artifi cial nanostructures provide an approach for high spatial resolution colour fi ltering and spectral imaging with extremely compact device architectures.

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“…Although NIL-based approaches have proven excellent resolutions, there are still significant challenges in meeting the stringent requirements of semiconductor IC manufacturing, especially in terms of defect control and production-level throughput, which requires printing 60-80 wafers per hour with extremely high yields. On the other hand, because of its simplicity this technique has found numerous applications in electronics (e.g., hybrid plastic electronics, [17] organic electronics and photonics, [18,19] nanoelectronic devices in Si [20,21] and in GaAs [22] ), in photonics (e.g., organic lasers, [23] conjugated [24] and nonlinear optical polymer nanostructures, [25] highresolution organic light-emitting diode (OLED) pixels, [26,27] diffractive optical elements, [28] broadband polarizers [29][30][31] ), in magnetic devices (e.g., single-domain magnetic structures, [32,33] high-density patterned magnetic media and highcapacity disks, [34,35,36] ), in nanoscale control of polymer crystallization, [37] and in biological applications (e.g., manipulating…”

Section: Introductionmentioning

confidence: 99%

Nanoimprint Lithography: Methods and Material Requirements

2007

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Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.

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High-performance nanowire-grid polarizers

Cited by 81 publications

References 8 publications

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

Plasmonic nanoresonators for high-resolution colour filtering and spectral imaging

Nanoimprint Lithography: Methods and Material Requirements

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