2013
DOI: 10.1063/1.4772616
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High pressure effect on structure, electronic structure, and thermoelectric properties of MoS2

Abstract: We systematically study the effect of high pressure on the structure, electronic structure and transport properties of 2H-MoS 2 , based on first-principles density functional calculations and the Boltzmann transport theory. Our calculation shows a vanishing anisotropy in the rate of structural change at around 25 GPa, in agreement with the experimental data. A conversion from van der Waals(vdW) to covalent-like bonding is seen. Concurrently, a transition from semiconductor to metal occurs at 25 GPa from band s… Show more

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Cited by 118 publications
(100 citation statements)
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“…3(a). For the P-MoS 2 , the band gap drops almost linearly with the strain, till it vanishes at 10%, which is consistent with previous calculations 31,32 . For the V S2 -and V Mo -MoS 2 , band gaps were found smaller than that of P-MoS 2 and close at 9% and 7%, respectively.…”
Section: Resultssupporting
confidence: 81%
See 1 more Smart Citation
“…3(a). For the P-MoS 2 , the band gap drops almost linearly with the strain, till it vanishes at 10%, which is consistent with previous calculations 31,32 . For the V S2 -and V Mo -MoS 2 , band gaps were found smaller than that of P-MoS 2 and close at 9% and 7%, respectively.…”
Section: Resultssupporting
confidence: 81%
“…For MoS 2 monolayer, we believe that conducting electrons play a more substantial role in determining magnetism. Tensile strain triggers a semiconductor-metal transition, and more importantly induces hybridization between orbitals in the vicinity of vacancies and delocalized Mo-d z orbitals 32 . This hybridization gives rise to magnetic instability in the Fermi level and to itinerant magnetism.…”
Section: Resultsmentioning
confidence: 99%
“…In agreement with prior theoretical studies 18,19,46 , our theoretically predicted band gap is found to depend inversely on pressure and that the critical pressure for the electronic phase transition is predicted to scale down for multilayered films from B16% normal compressive strain to B11% for bilayer MoS 2 ( Supplementary Fig. 8).…”
Section: Discussionsupporting
confidence: 76%
“…[145][146][147] The metallization arises from the overlap of the valance and conduction bands as the interlayer spacing decreases. Recently, both X-ray diffraction and Raman spectroscopy of ML (at ∌19 GPa) and bulk MoS 2 (between 20 and 30 GPa) under high pressure confirmed the above transitions.…”
Section: E Pressure-induced Semiconductor To Metallic Transitionmentioning
confidence: 99%