2014
DOI: 10.1038/ncomms4731
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Pressure-induced semiconducting to metallic transition in multilayered molybdenum disulphide

Abstract: Molybdenum disulphide is a layered transition metal dichalcogenide that has recently raised considerable interest due to its unique semiconducting and opto-electronic properties. Although several theoretical studies have suggested an electronic phase transition in molybdenum disulphide, there has been a lack of experimental evidence. Here we report comprehensive studies on the pressure-dependent electronic, vibrational, optical and structural properties of multilayered molybdenum disulphide up to 35 GPa. Our e… Show more

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Cited by 549 publications
(619 citation statements)
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“…This reversible modulation of the band gap could be used to make wavelength tunable phototransistors 16 , or MoS 2 strain sensors that have a sensitivity comparable to their state of the art silicon counterparts 20 . Moreover it has been suggested that strain could also improve the performance of MoS 2 transistors 21 , or could be used to create broadband light absorbers for energy harvesting 22 .The effect of strain on the band gap of 2D TMD's has been reported in a number of studies [9][10][11][12]20,23,24 , including uniaxial strains of up to ~4 % 25 and biaxial strains of up to ~3 % produced in highly localized sub-micron areas 26 . Band gap shifts in MoS 2 of ~300 meV have been induced by using very large hydrostatic pressures 27 , and tensile strain has induced shifts of as much as ~100 meV 11 .…”
mentioning
confidence: 99%
“…This reversible modulation of the band gap could be used to make wavelength tunable phototransistors 16 , or MoS 2 strain sensors that have a sensitivity comparable to their state of the art silicon counterparts 20 . Moreover it has been suggested that strain could also improve the performance of MoS 2 transistors 21 , or could be used to create broadband light absorbers for energy harvesting 22 .The effect of strain on the band gap of 2D TMD's has been reported in a number of studies [9][10][11][12]20,23,24 , including uniaxial strains of up to ~4 % 25 and biaxial strains of up to ~3 % produced in highly localized sub-micron areas 26 . Band gap shifts in MoS 2 of ~300 meV have been induced by using very large hydrostatic pressures 27 , and tensile strain has induced shifts of as much as ~100 meV 11 .…”
mentioning
confidence: 99%
“…This tradeoff might be mitigated by using high-quality h-BN gate dielectric where its atomic smoothness and high phonon energy are expected to enhance monolayer TMD mobilities as is the case for graphene 3,9 . Beyond bending studies, hydrostatic compressive strain of MoS 2 of about 15% has been recently reported to produce a semiconducting to metallic transition, which can enable new flexible or straintronic device or switch concepts 65 .…”
Section: Contemporary Flexible Performancementioning
confidence: 99%
“…Recently, both X-ray diffraction and Raman spectroscopy of ML (at ∼19 GPa) and bulk MoS 2 (between 20 and 30 GPa) under high pressure confirmed the above transitions. 99,120,148 Fig . 18(a) shows the Raman spectra of bulk MoS 2 at various pressures up to 57 GPa in both compression (denoted by c) and decompression (denoted by d) runs.…”
Section: E Pressure-induced Semiconductor To Metallic Transitionmentioning
confidence: 99%