High‐pressure scanning tunnelling microscopy study of microscopic gas discharges

Möller, Dietmar P. F.; Rüetschi, M.; Haefke, H.; Güntherodt, H.‐J.

doi:10.1002/(sici)1096-9918(199905/06)27:5/6<525::aid-sia518>3.3.co;2-8

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“…2 Electrical gas discharges of mesoscopic dimensions have proved to be a suitable tool to modify and influence surfaces on the microscopic scale. 3,4 To produce an electrical discharge on such a small scale, the interelectrode distance has to be varied and controlled very accurately. For this reason, a STM unit presented in Ref.…”

Section: Introductionmentioning

confidence: 99%

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Optical emission spectroscopy of microscopic gas discharges using a high-pressure scanning tunneling microscope

Möller

Eckert

Haefke

et al. 2000

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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A high-pressure scanning tunneling microscope (STM) unit was used to produce electrical discharges on a mesoscopic scale. Piezoelectric positioning elements allow to adjust the electrode gap with the precision needed. Optical emission spectroscopy was performed in high-pressure environments of helium and argon in a range of 5–20 bar. Spectra were recorded at different gas pressures and discharge currents. The increase of gas pressure changed line intensities and caused broadening of spectral lines of helium and argon. Increasing the discharge current yielded a higher intensity of the emitted light. The use of different electrode materials had no significant influence on the spectra. Electrical gas discharges on the microscopic scale can be used not only as a lithographic tool, but also as a compact light source of high luminance with emission of well-defined line spectra.

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Section: Introductionmentioning

confidence: 99%

“…For this reason, a STM unit presented in Ref. 4 was used to adjust the electrode gap with the precision needed. The small gap of only a few micrometers requires a high pressure of several bar according to the PASCHEN law.…”

Section: Introductionmentioning

confidence: 99%