Titanium diboride (TiB2) plates (about 1 mm maximum thickness) were prepared by chemical vapour deposition (CVD) using a TiCI 4, B2H o and H= system at deposition temperatures, Tae p of 1323-1773 K. The B/Ti atomic ratio in the deposits was 2, and the composition is strictly stoichiometric. Chlorine was not detected. The measured lattice parameters were a-0.3029 nm and c = 0.3229 nm. Density is in close agreement with the theoretical value (4.50 g cm-3). Preferred orientation of the CVD TiB 2 plates varies mainly with total gas pressures, Ptot. At Ptot = 4 kPa the (1 00) plane and at Ptot = 40 kPa the (1 1 0) plane is preferably oriented parallel to the substrates. The effect of Ptot on the preferred orientation is discussed thermodynamically, and explained by supersaturation in the gas phase.