In this study, deposition conditions for making a-SiO x :H are investigated systematically in order to obtain a high band gap material. We found that at given optical band gap, a-SiO x :H with favorable opto-electronic properties can be obtained when deposited using low CO 2 flow rates and deposition pressures. We also found that a low radio frequency power density is required in order to limit the effect of ion bombardment on the material properties of i-a-SiO x :H and thereby the solar cell performance. In addition, by decreasing the heater temperature from 300 to 200°C when making the i-a-SiO x :H, the V oc can be increased. We employed optimized p-doped and n-doped a-SiO x :H films into the p-i-n solar cells, and as a consequence, a high V oc of over 1 V and high fill factor (