2012
DOI: 10.1002/pssb.201100226
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High quality factor photonic resonators for nitride quantum dots

Abstract: International audienc

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Cited by 7 publications
(4 citation statements)
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“…12 Being on a Si platform provides the additional possibility of integration with increasingly popular Si-based photonic components. [13][14][15] However, those reported micro-disks, being in the early stages of development, exhibited mediocre optical characteristics, including having large modal volumes giving rise to multi-mode photo-pumped lasing; rough, and non-vertical facets resulting in low quality factors of $80; most importantly, the InGaN/GaN quantum wells (MQWs) within the micro-disk were not efficient enough to support lasing at visible light range nor at room temperature. Overcoming these limitations calls for micro-disks with smooth and vertical sidewalls as well as a reduction of disk dimensions.…”
mentioning
confidence: 97%
“…12 Being on a Si platform provides the additional possibility of integration with increasingly popular Si-based photonic components. [13][14][15] However, those reported micro-disks, being in the early stages of development, exhibited mediocre optical characteristics, including having large modal volumes giving rise to multi-mode photo-pumped lasing; rough, and non-vertical facets resulting in low quality factors of $80; most importantly, the InGaN/GaN quantum wells (MQWs) within the micro-disk were not efficient enough to support lasing at visible light range nor at room temperature. Overcoming these limitations calls for micro-disks with smooth and vertical sidewalls as well as a reduction of disk dimensions.…”
mentioning
confidence: 97%
“…Recent progress with InGaN optical emitters include strong coupling and polariton lasing in microcavities featuring distributed Bragg reflectors (DRBs), low threshold lasing, observations of Rabi oscillations, and single-photon emission . However, in spite of such progress the quality factors in the nitrides are often more than an order of magnitude lower than other III–V systems. This, as well as the large joint density of states of InGaN/GaN devices, causes lasing thresholds to be significantly higher than for other III–V systems. , …”
mentioning
confidence: 99%
“…Despite such promising properties and progress, inherent chemical, structural and electrical properties of III-nitride materials present severe challenges in terms of the realisation of optical devices perhaps best evidenced by the fact quality factors for III-nitride cavities are typically at least an order of magnitude lower than in other III-V systems [33][34][35]. Challenges with cavity fabrication include the very high chemical and thermal stability of GaN and InGaN-based materials, leading to difficulties in both dry and wet-etching [36].…”
Section: Iii-nitride Microcavities: Opportunities and Challengesmentioning
confidence: 99%