In
spite of the theoretical advantages associated with nitride microcavities,
the quality factors of devices with embedded indium gallium nitride
(InGaN) or gallium nitride (GaN) optical emitters still remain low.
In this work we identify threading dislocations (TDs) as a major limitation
to the fabrication of high quality factor devices in the nitrides.
We report on the use of cathodoluminescence (CL) to identify individual
TD positions within microdisk lasers containing either InGaN quantum
wells or quantum dots. Using CL to accurately count the number, and
map the position, of dislocations within several individual cavities,
we have found a clear correlation between the density of defects in
the high-field region of a microdisk and its corresponding quality
factor (Q). We discuss possible mechanisms associated
with defects, photon scattering, and absorption, which could be responsible
for degraded device performance.