1988
DOI: 10.1557/proc-144-297
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High Quality GaAs on Si and its Application to a Solar Cell

Abstract: Epitaxial growth using thermal annealing and a strained layer superlattice is studied to obtain high-quality GaAs device layers on Si substrates. Crystalline quality of GaAs-on-Si is found to improve with thermal cyclic annealing at temperatures higher than the growth temperature and cooling down to 300°C. It is also found that the optimum InGaAs/GaAs strained layer superlattice buffer structure is one whose total thickness is several times the calculated critical thickness for the average In-mole fraction of … Show more

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Cited by 7 publications
(16 citation statements)
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“…Additionally, thin strained layers (SLs) and superlattices introduced into the bulk GaAs buffer have been shown to facilitate the annihilation of TDs and minimize the dislocation propagation into the active layers of interest. Such an approach led to one of the highest efficiencies for heteroepitaxial 1J GaAs-on-Si solar cells (Ohmachi et al 1988;Yamaguchi 2014). More recent approaches involve the growth of metamorphic graded buffers (e.g.…”
Section: Heteroepitaxial Approach For Iii-v-on-si Integrationmentioning
confidence: 99%
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“…Additionally, thin strained layers (SLs) and superlattices introduced into the bulk GaAs buffer have been shown to facilitate the annihilation of TDs and minimize the dislocation propagation into the active layers of interest. Such an approach led to one of the highest efficiencies for heteroepitaxial 1J GaAs-on-Si solar cells (Ohmachi et al 1988;Yamaguchi 2014). More recent approaches involve the growth of metamorphic graded buffers (e.g.…”
Section: Heteroepitaxial Approach For Iii-v-on-si Integrationmentioning
confidence: 99%
“…For the growth of 1J GaAs solar cell on Si, (100) Si substrates with 2˚offcut Figure 2 Cross-sectional TEM image of heteroepitaxial GaAs grown on Si using (a) only TCA , (b) TCA along with In 0.07 Ga 0.93 As SL (Takano et al 1998), reprinted with permission from Takano et al (1998) and Soga et al (1996). References Takano et al (1998) Copyright 1998, AIP Publishing LLC; Soga et al (1996) Copyright 1996, AIP Publishing LLC toward [110] were utilized (Ohmachi et al 1988). An initial 10-to 15-nm thick low temperature GaAs was grown at 400˚C, followed by the subsequent growth of~2-µm thick GaAs at 700˚C.…”
Section: Integration Approaches For Iii-v-on-si Solar Cells Heteroepimentioning
confidence: 99%
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