2011
DOI: 10.1016/j.jallcom.2010.10.189
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High quality GaN epilayers grown on Si (111) with thin nonlinearly composition-graded AlxGa1−xN interlayers via metal-organic chemical vapor deposition

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Cited by 33 publications
(13 citation statements)
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“…Due to lattice parameter differences, i.e. 0.3823 nm for Si (111) versus 0.3112 nm for AlN (0001) (or 0.3189 nm for GaN (0001)), the interface density of states can be very high with epitaxial growth [17]. The extensive practice of direct wafer bonding between two materials, which leads to poor interface quality with a very high density of interface states, has also proven to be infeasible for forming Si/GaN junctions of needed quality [18].…”
Section: Introductionmentioning
confidence: 99%
“…Due to lattice parameter differences, i.e. 0.3823 nm for Si (111) versus 0.3112 nm for AlN (0001) (or 0.3189 nm for GaN (0001)), the interface density of states can be very high with epitaxial growth [17]. The extensive practice of direct wafer bonding between two materials, which leads to poor interface quality with a very high density of interface states, has also proven to be infeasible for forming Si/GaN junctions of needed quality [18].…”
Section: Introductionmentioning
confidence: 99%
“…However, most studies suggested the total thickness of graded-AlGaN buffer layer is less than 1μm for crack-free GaN grown on Si [5,[11][12][13][14], because AlGaN layer with a large thickness would relax significantly and may not exert adequate compressive stress on GaN overlayer, resulting in cracking of GaN layer [11]. In this work, a combination of 1.2 μm-thick step-graded AlGaN TLs and AlGaN superlattice layer as buffer layers…”
mentioning
confidence: 95%
“…Efforts in this line have been focused on (i) researching modifications of parameters and/or steps in the growth process, and (ii) using additional buffer-like layers to induce the recombination of these defects. For AlGaN/GaN systems, one evident approach for reducing the dislocation density consists in increasing the GaN layer thickness [17] (this is also valid in most systems) [18], but generally better results have been achieved using low temperature AlN layers, AlN/GaN superlattices (SL) [19], Al x Ga 1 À x N where the composition x varies along the growth direction [20,21], or other interesting solutions, such as using CrN layers [22], Si d-doping [23] or even He implantation [24].…”
Section: Introductionmentioning
confidence: 99%