2015
DOI: 10.1016/j.mssp.2014.11.010
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High-quality n-type aluminum gallium nitride thin films grown by interrupted deposition and in-situ thermal annealing

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Cited by 4 publications
(5 citation statements)
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“…In our previous work, we have used Si Ga δ doping in Al 0.6 Ga 0.4 N alloys to increase the n-type carrier density30. Recent theoretical works predicted that the nanoscale (AlN) m /(GaN) n (m > n) SL could convert the valence-band maximum (VBM) from the crystal-field split-off hole to heavy hole band, leading to the increase of the transverse electric (TE) polarized light emission efficiency3132.…”
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confidence: 99%
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“…In our previous work, we have used Si Ga δ doping in Al 0.6 Ga 0.4 N alloys to increase the n-type carrier density30. Recent theoretical works predicted that the nanoscale (AlN) m /(GaN) n (m > n) SL could convert the valence-band maximum (VBM) from the crystal-field split-off hole to heavy hole band, leading to the increase of the transverse electric (TE) polarized light emission efficiency3132.…”
mentioning
confidence: 99%
“…Many works were concentrated on the doping in the superlattices (SLs) 23 24 25 26 27 28 29 , where a periodic oscillation of the valence band edge was created by the valence band discontinuity and innate polarization fields in Mg-doped AlGaN/GaN SLs, resulting in the accumulation of holes near the valance band edge close to the Fermi energy forming the so-called two-dimensional (2D) hole gases. In our previous work, we have used Si Ga δ doping in Al 0.6 Ga 0.4 N alloys to increase the n-type carrier density 30 . Recent theoretical works predicted that the nanoscale (AlN) m /(GaN) n (m > n) SL could convert the valence-band maximum (VBM) from the crystal-field split-off hole to heavy hole band, leading to the increase of the transverse electric (TE) polarized light emission efficiency 31 32 .…”
mentioning
confidence: 99%
“…Many studies have showed that heating treatments improve the crystal quality of semiconductor heterostructures. For example, in AlGaN thin films [10] and in InAs/GaAs QDs [14], a reduction in the density of threading dislocations after the heating process has been reported.…”
Section: Resultsmentioning
confidence: 99%
“…Dislocations introduce additional electronic states within the band gap, leading to nonradiative recombination phenomena. The application of a post-growth thermal annealing is a typical practicein order to improvethe material quality [10]. Two types of thermal treatments are normally applied in these materials: ex-situ and in situ ones.…”
Section: Introductionmentioning
confidence: 99%
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