High rate deposition of nanocrystalline silicon by thermal plasma enhanced CVD

Cao, Tengfei; Yan, Binhang; Cheng, Yi

doi:10.1039/c3ra43481h

Cited by 12 publications

(15 citation statements)

References 25 publications

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“…36 The plasma working gas was Ar. Detailed information of this APTPECVD apparatus could be found elsewhere.…”

Section: Fabrication Of Sic Nanocrystalsmentioning

confidence: 99%

“…[28][29][30][31][32][33] This plasma technique has the ability to dissociate and activate various gas precursors. 35,36 SiC nanocrystals covered by carbon films and embedded in the complex of graphite and amorphous silicon (a-Si) have also been fabricated with SiCl4 and CH4 as silicon and carbon sources in atmospheric pressure thermal plasma. 28 Low pressure cold plasma enhancement is mostly used in the PECVD of SiC nanocrystals even though this method has a relatively low product capability.…”

Section: Introductionmentioning

confidence: 99%

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High rate fabrication of room temperature red photoluminescent SiC nanocrystals

et al. 2015

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Table of contents entrySiC nanocrystals with room temperature red region photoluminescence are fabricated at high rate in atmospheric pressure thermal plasma using SiCl4 and C2H2 as silicon source and carbon source. AbstractHigh rate fabrication of thin film complex consisting of cubic-SiC nanocrystals, amorphous silicon and graphite was realized by an atmospheric pressure thermal plasma enhanced chemical vapor deposition (APTPECVD) process with SiCl4 and C2H2 as silicon source and carbon source, respectively. The morphology, crystal structure and surface chemical composition of the products were characterized. The APTPECVD SiC nanocrystals have average diameters between 18-30 nm.A room temperature red region photoluminescence (PL) property originated from quantum confinement effect of these SiC nanocrystals was observed under UV wavelength excitation.Moreover, pure SiC nanocrystals with red region PL property can be obtained after a simple posttreatment including calcining and etching processes. These red photoluminescent SiC nanocrystals could be utilized as biomarkers in bioimaging and drug delivery.

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“…36 The plasma working gas was Ar. Detailed information of this APTPECVD apparatus could be found elsewhere.…”

Section: Fabrication Of Sic Nanocrystalsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

High rate fabrication of room temperature red photoluminescent SiC nanocrystals

et al. 2015

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“…During the past two decades, there has been great progress in the synthesis of low‐dimensional Si nanostructures. In particular, multiple chemical and physical strategies including magnetron sputtering, chemical vapor deposition (CVD), ion implantation, and chemical etching have been developed to fabricate Si materials in 0D Si (including Si nanoparticles and quantum dots), 1D Si (including Si nanowires, nanotubes, and nanorods) and 3D Si (including nanoporous Si) . However, synthesis of 2D Si materials with ultrathin thickness (lower than 5 nm) still remains a significant challenge.…”

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confidence: 99%

Scalable Synthesis of 2D Si Nanosheets

et al. 2017

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2D Si nanomaterials have attracted tremendous attention due to their novel properties and a wide range of potential applications from electronic devices to energy storage and conversion. However, high-quality and large-scale fabrication of 2D Si remains challenging. This study reports a room-temperature and one-step synthesis technique that leads to large-scale and low-cost production of Si nanosheets (SiNSs) with thickness ≈4 nm and lateral size of several micrometers, based on the intrinsic delithiation process of chemically leaching lithium from the Li Si alloy. Together with experimental results, a combination of theoretical modeling and atomistic simulations indicates that the formation of single SiNS arises from spontaneous delamination of nanosheets from their substrate due to delithiation-induced mismatch. Subsequently, the synthesized Si nanosheets evolve from amorphous to nanocrystalline to crystalline structures during annealing at different temperatures. It is demonstrated that these SiNSs possess unique mechanical properties, in particular ultralow friction, in contrast to their bulk counterparts.

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“…Due to the presence of a diversity of energetic species such as electrons, ions, atoms, charged particles and excited molecules, plasma is applied to stimulate the chemistry especially the ones that can hardly be realized in mild ways, e.g. methane reforming [2][3][4][5], CO 2 conversion [6][7][8], VOC decomposition [9][10][11], surface treatment of polymer surfaces [12][13][14][15], medical treatment [16][17][18][19][20], material synthesis [21][22][23][24][25], etc. Plasma technology is commercialized and industrialized in the fields of ozone production, material surface modification, air/water cleaning, medical facilities, etc., which has already shown promising energy effects and economic benefits.…”

Section: Introductionmentioning

confidence: 99%

Microplasma: A New Generation of Technology for Functional Nanomaterial Synthesis

Lin

Wang

2015

Plasma Chem Plasma Process

138

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Plasma technology has been widely applied in the ozone production, material modification, gas/water cleaning, etc. Various nanomaterials were produced by thermal plasma technology. However, the high temperature process and low uniformity products limit their application for the high value added chemicals synthesis, for example the functional materials or the temperature sensitive materials. Microplasma has attracted significant attentions from various fields owing to its unique characteristics, like the highpressure operation, non-equilibrium chemistry, continuous-flow, microscale geometry and self-organization phenomenon. Its application on the functional nanomaterial synthesis was elaborately discussed in this review paper. Firstly, the main physical parameters were reviewed, which include the electron temperature, electron energy distribution function, electron density and the gas temperature. Then four representative microplasma configurations were categorized, and the proper selection of configuration was summarized in light of different conditions. Finally the synthesis, mechanism and application of some typical nanomaterials were introduced. Plasma Chem Plasma Process (2015) 35:925-962

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High rate deposition of nanocrystalline silicon by thermal plasma enhanced CVD

Cited by 12 publications

References 25 publications

High rate fabrication of room temperature red photoluminescent SiC nanocrystals

High rate fabrication of room temperature red photoluminescent SiC nanocrystals

Scalable Synthesis of 2D Si Nanosheets

Microplasma: A New Generation of Technology for Functional Nanomaterial Synthesis

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