High-rate deposition of thick (Cr,Al)ON coatings by high speed physical vapor deposition

Bobzin, Kirsten; Brögelmann, Tobias; Kalscheuer, Christian; Liang, T.

doi:10.1016/j.surfcoat.2017.05.034

Cited by 33 publications

(22 citation statements)

References 53 publications

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“…The use of responsible energy practices has sensitized users of this technique, even though it is still an area to improve. Enlightening the energy efficiency of the whole process has an impact on costs, but also on the environment [68,72,73].…”

Section: Sputtering Depositions Improvementsmentioning

confidence: 99%

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

et al. 2018

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Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand.

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Section: Sputtering Depositions Improvementsmentioning

confidence: 99%

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

et al. 2018

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“…Consequently, the deposition rate was about 70 % lower than the deposition of the same coating without rotation. Moreover, compared to previous studies on coating deposition of oxynitrides and oxides by high-speed physical vapor deposition, the deposition rate here is apart from the rotation still much lower [32,35]. It should be pointed out that the present study focuses on the first development of the nanocomposite (Ti, Al, Si)N coating system by highspeed physical vapor deposition.…”

Section: Coating Characterizationmentioning

confidence: 80%

“…The high-speed physical vapor deposition technology is a special variant of the physical vapor deposition technique, characterized by hollow cathode glow discharge and gas flow sputtering, Figure 1. A detailed description of this technology can be found in [32].…”

Section: Introductionmentioning

confidence: 99%

“…The reactive gas nitrogen is injected from a gas inlet outside the hollow cathode and the forced flow of the working gas argon efficiently prevents the contact between nitrogen gas and the targets, Figure 1. The suitability of the high-speed physical vapor deposition technology for the highrate deposition of oxynitride and oxide coatings has already been proved in previous studies [32,35]. However, the development of nanocomposite (Ti, Al, Si)N coatings by high-speed physical vapor deposition has not yet been reported.…”

Section: Introductionmentioning

confidence: 99%

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Deposition of a nanocomposite (Ti, Al, Si)N coating with high thickness by high‐speed physical vapor deposition

Bobzin

Brögelmann

Kalscheuer

et al. 2020

Materialwissenschaft Werkst

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Nanocomposite coatings such as (Ti, Al, Si)N have been demonstrated as promising candidates for the use as protection against solid particle erosion for compressor blades. Typically, nanocomposite (Ti, Al, Si)N coatings are deposited by different physical vapor deposition (PVD) techniques. However, the relatively low coating thickness up to a few micrometers due to low deposition rates leads to a limited lifetime of the coatings under erosive particle bombardment. In this study, the deposition of a nanocomposite (Ti, Al, Si)N coating was performed by a hollow cathode gas flow sputtering method, the high‐speed physical vapor deposition, which enables the high‐rate deposition of thick coatings. Morphology and microstructure of the coating were investigated via scanning electron microscopy and transmission electron microscopy, respectively. Tribological characterization by impact tests and erosion tests demonstrates that the nanocomposite (Ti, Al, Si)N coated sample reveals a promising resistance against impact loads and the solid particle erosion. Summarily, nanocomposite (Ti, Al, Si)N coatings deposited by the high‐speed physical vapor deposition provide a high potential for the erosion protection of compressor blades.

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“…Some formulations have been tested under friction [23] and machining operations [13], showing different performances in comparison to industrial coating formulations. Bobzin et al [24] deposited thick CrAlO and CrAlON using high-speed deposition sputtering. The influence of the bias has also been reported, in particular the effects of bipolar pulsing and duty cycle CAE deposited CrAlFeO and CrAlO arc coatings [25,26].…”

Section: Introductionmentioning

confidence: 99%

Chemical and mechanical stability of air annealed cathodic arc evaporated CrAlON coatings

Almandoz

Fuentes

Fernández

et al. 2018

Surface and Coatings Technology

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This study reports the synthesis and characterization of ternary Cr-Al-O and quaternary Cr-Al-ON coatings deposited by cathodic arc physical vapour deposition, for various nitrogen and oxygen mass flow ratios during the growth process. The composition, microstructure, indentation hardness and modulus of the films have been characterized by scanning electron microscopy, electron probe micro-analysis, X-ray diffraction, and nanoindentation techniques. The evolution of the microstructure and mechanical properties of the coatings after ambient air annealing from 800ºC up to 1100 ºC have been investigated. As the oxygen to nitrogen mass flow increases, the as-deposited coatings exhibit lower hardness, higher roughness, lower crystallinity and a more marked columnar structure. At oxygen to nitrogen mass flow ratios bigger than 10/90, the coatings exhibit a stoichiometry of the type (CrAl)2+O3-. Only the coatings with an oxygen to nitrogen mass flow ratio smaller than 10/90 retained nitrogen in their compositions. In all cases, the coatings developed a cubic fcc lattice structure. After annealing at 1100 ºC the resulting microstructure showed a clear dependency upon the initial composition of the films. The evolution of the microstructure during the high temperature tests, as well as the analysis of the nanoindentation hardness, composition and thickness also provided valuable information about the combined effects of the thermal stability and the oxidation of the deposited coatings.

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High-rate deposition of thick (Cr,Al)ON coatings by high speed physical vapor deposition

Cited by 33 publications

References 53 publications

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

Deposition of a nanocomposite (Ti, Al, Si)N coating with high thickness by high‐speed physical vapor deposition

Chemical and mechanical stability of air annealed cathodic arc evaporated CrAlON coatings

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