High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells

Facile synthesis of highly oriented p-type aluminum co-doped zinc oxide film with aqua ammonia

“…In the case of NH 4 Cl addition, which is mildly acidic, the H and Cl had combined to form HCl. HCl is a known etchant for ZnO and is often used to create a texturized ZnO films for TCOs [41]. This result is also reflected in the EDX elemental study, where ZnO has slightly less zinc content than other samples, indicating wet etch of oxide has occurred.…”

Impurity-doped ZnO Thin Films Prepared by Physical Deposition Methods Appropriate for Transparent Electrode Applications in Thin-film Solar Cells

“…Light scattering characteristics obtainable by surface texturing 3.2.1 Influence of deposition method and RTA treatment The suitability of the light scattering characteristics for thin-film solar cell applications was evaluated by carrying out surface texturing of impurity-doped ZnO thin films with wet-chemical etching conducted either before or after heat treatment with RTA as well as without RTA treatment. To evaluate the light scattering characteristics of impurity-doped ZnO thin films with a surface textured by wet-chemically etching, the optical transmittance and the diffusive component of the films were measured; the haze value was estimated from these measured transmittances [11,18,20,22,32,33]. It was found that the obtainable light scattering characteristics in impurity-doped ZnO thin films with a textured surface structure were considerably affected by the thickness and the doped impurity as well as the kind of deposition method used.…”

“…At the present time, AZO and B-doped ZnO (BZO) thin films are in practical use for transparent electrode applications in CuIn 1-X Ga X Se 2 -based thin-film solar cells [9][10][11][12]. In addition, impurity-doped ZnO thin films, such as AZO, GZO and BZO with a textured surface structure as well as a high transmittance in the near-infrared region, have recently attracted much attention for transparent electrode applications in Si-based thin-film solar cells [13][14][15][16][17][18][19][20][21][22][23][24]. It is necessary to form impurity-doped ZnO thin films with a doubly textured surface structure that can effectively scatter the incident visible and near-infrared light [25].…”

Surface texturing studies of bilayer transparent conductive oxide (TCO) structures as front electrode for thin-film silicon solar cells

“…After deposition, these TCO-coated glass sheets were cut into small pieces (each 5 cm 9 7 cm) for the wetchemical texturing studies. Various chemicals such as hydrochloric (HCl) and hydrofluoric (HF) acid have been used for the post-deposition etching of ZnO films [21][22][23][24][25]. The resultant surface morphologies vary as the etchant changes.…”