High resolution lithography with PDMS molds

Bender, Markus; Plachetka, Ulrich; Ran, Jianhua; Fuchs, Andreas; Vratzov, B.; Kurz, H.; Glinsner, T.; Lindner, Florian

doi:10.1116/1.1824057

Cited by 97 publications

(78 citation statements)

References 9 publications

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“…Since the amount of material used for the substrate typically makes up more than 99% of the entire electronic element (roughly 50 µm substrate vs. about 100 nm of active material), it mainly determines the mechanical parameters of the final device. The elastic material typically used for stretchable electronics is Poly(dimethylsiloxane) PDMS 1,2,25 , which is well-known also in other fields of material science 158,159 and widely used in the food, cosmetics and medical industry. angle of about 140° between the backbone atoms gives the polymer chain an intrinsic stretchability 160 .…”

Section: Polydimethylsiloxane (Pdms)mentioning

confidence: 99%

Stretchable Magnetoelectronics

et al. 2011

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Abstract:In this work, stretchable magnetic sensorics is successfully established by combining metallic thin films revealing a giant magnetoresistance effect with elastomeric materials. Stretchability of the magnetic nanomembranes is achieved by specific morphologic features (e.g. wrinkles), which accommodate the applied tensile deformation while maintaining the electrical and magnetic integrity of the sensor device. The entire development, from the demonstration of the world-wide first elastically stretchable magnetic sensor to the realization of a technology platform for robust, ready-touse elastic magnetoelectronics with fully strain invariant properties, is described. The prepared soft giant magnetoresistive devices exhibit the same sensing performance as on conventional rigid supports, but can be stretched uniaxially or biaxially reaching strains of up to 270% and endure over 1,000 stretching cycles without fatigue. The comprehensive magnetoelectrical characterization upon tensile deformation is correlated with in-depth structural investigations of the sensor morphology transitions during stretching.With their unique mechanical properties, the elastic magnetoresistive sensor elements readily conform to ubiquitous objects of arbitrary shapes including the human skin. This feature leads electronic skin systems beyond imitating the characteristics of its natural archetype and extends their cognition to static and dynamic magnetic fields that by no means can be perceived by human beings naturally.Various application fields of stretchable magnetoelectronics are proposed and realized throughout this work. The developed sensor platform can equip soft electronic systems with navigation, orientation, motion tracking and touchless control capabilities. A variety of novel technologies, like smart textiles, soft robotics and actuators, active medical implants and soft consumer electronics will benefit from these new magnetic functionalities. Michael Melzer: Stretchable MagnetoelectronicsOutline 4

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Section: Polydimethylsiloxane (Pdms)mentioning

confidence: 99%

Stretchable Magnetoelectronics

et al. 2011

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“…According to these requirements, an elastomeric PDMS mold has been most commonly used for NIL-based patterning of functional resist. The PDMS has high permeability [87][88][89], so the solvent and the gas product can be removed through the PDMS mold during the NIL process. Additionally, the low surface energy [90,91] of the PDMS mold promotes uniform transferring of functional nano-patterns from the PDMS mold to the substrate without problems related to resist sticking to the mold.…”

Section: Process Types Of Direct Nil Using Functional Resistsmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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“…After UV exposure, the gradual vacuum force removes the mold once more. EV Group Inc. [56] also adopted PDMS molds. The difference is that the mold comprises two soft PDMS layers with different degrees of hardness.…”

Section: Fig 12 Insert a Low-index Layer To Improve Mode Coupling Wmentioning

confidence: 99%