“…Recently, many wide-band gap metal oxide semiconductor (MOS) materials, including zinc oxide (ZnO), nickel oxide (NiO), copper oxide (CuO), tin oxide (SnO 2 ), titanium dioxide (TiO 2 ), lead dioxide (PbO 2 ), ruthenium oxide (RuO 2 ), iridium dioxide (IrO 2 ), tungsten trioxide (WO 3 ), tantalum pentoxide (Ta 2 O 5 ), antimony trioxide (Sb 2 O 3 ), and indium oxide (In 2 O 3 ), have attracted considerable interest because of their special material performance in pH nanodevices. − Among them, the ZnO structure belongs to the II–VI groups of n-type MOS materials and has a large band gap of approximately 3.37 eV at room temperature and a high-exciton binding energy of about 60 meV. − ZnO MOS with crystal lattice constants of a = 0.3249 nm and c = 0.5207 nm is a hexagonal wurtzite system. It has many outstanding properties, such as low price, nontoxicity, remarkable thermochemical stability, excellent carrier mobility, good biocompatibility, and high mechanical strength. , One-dimensional (1-D) ZnO nanomaterials have been used in various electric components, such as pH sensors, gas sensors, ultraviolet photodetectors (UV PDs), nanogenerators (NGs), field-emission (FE) emitters, photocatalysts, light-emitting diodes (LEDs), glucose sensors, thin-film transistors (TFTs), and solar cells. − Up to now, many researchers have studied the preparation methods of ZnO nanorods (NRs), including thermal evaporation, hydrothermal methods, vapor–solid (VS), pulsed laser deposition (PLD), electrochemical deposition, and chemical vapor deposition (CVD).…”