2015
DOI: 10.1039/c5nr05512a
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High speed, high temperature electrical characterization of phase change materials: metastable phases, crystallization dynamics, and resistance drift

Abstract: During the fast switching in Ge2Sb2Te5 phase change memory devices, both the amorphous and fcc crystalline phases remain metastable beyond the fcc and hexagonal transition temperatures respectively. In this work, the metastable electrical properties together with crystallization times and resistance drift behaviour of GST are studied using a high-speed, device-level characterization technique in the temperature range of 300 K to 675 K.

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Cited by 56 publications
(45 citation statements)
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“…The reset resistance is observed to drift over time as expected from melt-quenched GST (R reset $ t n ) with an exponent (n) of 0.1 (Ref. 14). 1 MX or 50 X is used as R termination for the resistance measurement depending on the cell resistance.…”
Section: Methodsmentioning
confidence: 99%
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“…The reset resistance is observed to drift over time as expected from melt-quenched GST (R reset $ t n ) with an exponent (n) of 0.1 (Ref. 14). 1 MX or 50 X is used as R termination for the resistance measurement depending on the cell resistance.…”
Section: Methodsmentioning
confidence: 99%
“…While determining the amorphous volume, the resistivity of 96.4 X cm is used for the amorphous region which is obtained as an average value from measurements of 35 devices. 14 The curvature of the amorphouscrystalline interface as shown in Figure 2(b) is determined by simulating a reset pulse (supplementary Figure S2).…”
Section: Thermal Modellingmentioning
confidence: 99%
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“…Kedua gaya ini bekerja dalam arah yang berlawanan dan ion mencapai kecepatan akhir, yaitu kecepatan hanyut ion (s), jika gaya mempercepat F diimbangi oleh gaya perlambatan F ' . Gaya neto menjadi nol (F=F ' ) (195)(196)(197)(198)(199)(200) jika :…”
Section: Kecepatan Hanyutunclassified