2017
DOI: 10.1002/pssa.201600436
|View full text |Cite
|
Sign up to set email alerts
|

High temperature annealing and CVD growth of few-layer graphene on bulk AlN and AlN templates

Abstract: Phone: þ33 4 93 95 78 30, Fax: þ33 4 93 95 83 61Graphene and AlN are promising materials, interesting to combine together. In this study, we will present first results for direct growth of graphene on bulk AlN and on AlN templates using chemical vapor deposition, including the annealing of these substrates at high temperatures. Atomic force microscopy (AFM) enabled us to study the evolution of the AlN surface morphology after annealing and growth. Few-layer graphene deposition is demonstrated on the basis of X… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
9
0

Year Published

2017
2017
2022
2022

Publication Types

Select...
7
1

Relationship

1
7

Authors

Journals

citations
Cited by 10 publications
(9 citation statements)
references
References 39 publications
0
9
0
Order By: Relevance
“…Gr deposition on these non-catalytic surfaces represents a challenging task, as it requires significantly higher temperatures as compared to conventional deposition on metals. The first experimental works addressing this issue showed the possibility of depositing a few layers of Gr both on bulk AlN (Al and N face) and on AlN templates grown on different substrates, such as Si (111) and SiC, at temperatures >1250 • C using propane (C 3 H 8 ) as the carbon source, without significantly degrading the morphology of AlN substrates/templates [119,120]. In spite of the very promising results of these experiments, further work will be required to evaluate the feasibility and the effects of CVD Gr growth onto AlN/GaN or AlGaN/GaN heterostructures.…”
Section: Materials Science Issues and Challengesmentioning
confidence: 99%
“…Gr deposition on these non-catalytic surfaces represents a challenging task, as it requires significantly higher temperatures as compared to conventional deposition on metals. The first experimental works addressing this issue showed the possibility of depositing a few layers of Gr both on bulk AlN (Al and N face) and on AlN templates grown on different substrates, such as Si (111) and SiC, at temperatures >1250 • C using propane (C 3 H 8 ) as the carbon source, without significantly degrading the morphology of AlN substrates/templates [119,120]. In spite of the very promising results of these experiments, further work will be required to evaluate the feasibility and the effects of CVD Gr growth onto AlN/GaN or AlGaN/GaN heterostructures.…”
Section: Materials Science Issues and Challengesmentioning
confidence: 99%
“…Based on these results, the N2/C3H8 CVD growth experiments will be carried out at the intermediate temperature of 1350 °C, properly chosen to reduce AlGaN thermal decomposition and to provide, at the same time, the energy needed for Gr formation on this non-catalytic surface. It is worth noting that the same temperature has been recently employed to achieve optimal Gr growth onto AlN/SiC templates by a N2/C3H8 CVD process [34].…”
Section: Resultsmentioning
confidence: 99%
“…GNSs are usually synthesized from “top-down” mechanical, chemical, thermal and electronic routes and via the solvent- or surfactant-based exfoliation of graphite. The “bottom-up” growth from molecular substrates has also been achieved, using the CVD method and via the graphitization of silicon carbide [ 106 , 107 , 108 , 109 , 110 , 111 , 112 ].…”
Section: Synthesis Of Larger Carbon Allotropesmentioning
confidence: 99%