2000
DOI: 10.1016/s0040-6090(00)01346-8
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High temperature materials for thin-film thermocouples on silicon wafers

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Cited by 68 publications
(32 citation statements)
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“…The Seebeck coefficient of the thermocouple at 1247 o C can reach to 136.3 µV/ o C, and the value of average Seebeck coefficient can reach 128.4 µV/ o C throughout the heating process. This value is much higher than the metal material thermocouples, such as platinum-palladium (<15 µV/ o C), 11 platinum-10% rhodium-platinum (8.28 µV/ o C). 12 The thermocouples have stronger tolerance, especially for harsh environments.…”
Section: Resultsmentioning
confidence: 81%
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“…The Seebeck coefficient of the thermocouple at 1247 o C can reach to 136.3 µV/ o C, and the value of average Seebeck coefficient can reach 128.4 µV/ o C throughout the heating process. This value is much higher than the metal material thermocouples, such as platinum-palladium (<15 µV/ o C), 11 platinum-10% rhodium-platinum (8.28 µV/ o C). 12 The thermocouples have stronger tolerance, especially for harsh environments.…”
Section: Resultsmentioning
confidence: 81%
“…[8][9][10] Noble metals have been developed to meet the harsh measurement, such as platinum, palladium, 10%Rh/Pt and iridium. [11][12][13][14] However, in the extreme environment with high temperature and strong air/oxygen gas flow, the metal-based thin film thermocouples are prone to oxidization or fall off from the substrate. They have to work as armored thermocouple with ceramics cannula to get the high temperature wear and corrosion protection at the expenses of slow response.…”
Section: Introductionmentioning
confidence: 99%
“…Resistivity and thermopower are also modeled to vary from bulk based on the ratio of film thickness to electron mean free path, which is also dependent on the film's effective work function [25]. Based on reported thermopower for films of various thicknesses [25,27], the electron mean free path is less than 200 nm for sputtered noble metal films. For films greater than 2 μm as we have used in this work, the film thickness is not considered an issue.…”
Section: Resultsmentioning
confidence: 99%
“…In sharp contrast to traditional thermocouple wires, thin film thermocouples (TFTCs) can be directly deposited onto the measured components with a thickness of less than 30 µm. Due to their negligible mass and volume, TFTCs can provide much faster response with minimal disturbance of the gas flow over the surface and almost no impact on the physical characteristics of the measured components [1][2][3][4][5][6][7][8][9]. Metallic-based wire thermocouples such as Pt-PtRh or NiCr-NiSi have been widely applied for decades.…”
Section: Introductionmentioning
confidence: 99%
“…Metallic-based wire thermocouples such as Pt-PtRh or NiCr-NiSi have been widely applied for decades. However, when deposited in thin film form, the stability and linearity of TFTC is subject to different degrees of degradation-especially in the high temperature range and in highly oxidizing environments [8,10]. Different approaches have been taken to optimize the stability and thermoelectric performance of such metallic TFTCs [4,10,11].…”
Section: Introductionmentioning
confidence: 99%