2013 3rd International Conference on Advancements in Nuclear Instrumentation, Measurement Methods and Their Applications (ANIMM 2013
DOI: 10.1109/animma.2013.6728068
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High total ionizing dose and temperature effects on micro- and nano-electronic devices

Abstract: This paper investigates the vulnerability of several micro-and nano-electronic technologies to a mixed harsh environment including high total ionizing dose at MGy levels and high temperature. Such operating conditions have been revealed recently for several applications like new security systems in existing or future nuclear power plants, fusion experiments, or deep space missions. In this work, the competing effects already reported in literature of ionizing radiations and temperature are characterized in ele… Show more

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Cited by 3 publications
(1 citation statement)
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“…Measurements on realistic test vehicles are now under way focusing on two techniques: ion implantation and UHV/CVD layer growth. A CMOS compatible process with a SiGe add on fabrication step will be a successful outcome of this R&D. One subsequent step will be to assure the radiation hardening of the process but this seems to our reach for the present-day technological nodes [6] [12][13].…”
Section: Discussionmentioning
confidence: 99%
“…Measurements on realistic test vehicles are now under way focusing on two techniques: ion implantation and UHV/CVD layer growth. A CMOS compatible process with a SiGe add on fabrication step will be a successful outcome of this R&D. One subsequent step will be to assure the radiation hardening of the process but this seems to our reach for the present-day technological nodes [6] [12][13].…”
Section: Discussionmentioning
confidence: 99%