2000
DOI: 10.1109/55.817446
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High-voltage devices for 0.5-μm standard CMOS technology

Abstract: The feasibility of the smart voltage extension (SVX) technique featuring complementary high-voltage devices without any modifications of the process steps of an 0.5-m standard CMOS technology is discussed here. This letter focuses on the optimization of the breakdown voltage of the HVNMOS as well as the possible implementation of the HVPMOS. Different high-voltage options with increasing process modification steps are discussed as a function of the required high-voltage capabilities.

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Cited by 14 publications
(5 citation statements)
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“…The traditional design solution adopts LDO with power transistor of DMOS to finish the high to low voltage conversion. In general, the area of DMOS is larger than normal MOS [2,3] . Furthermore, traditional power supply transform technique needs no less than three circuit blocks.…”
Section: Analysis Of Feasibility For the Proposed Design 21 Tradition...mentioning
confidence: 96%
“…The traditional design solution adopts LDO with power transistor of DMOS to finish the high to low voltage conversion. In general, the area of DMOS is larger than normal MOS [2,3] . Furthermore, traditional power supply transform technique needs no less than three circuit blocks.…”
Section: Analysis Of Feasibility For the Proposed Design 21 Tradition...mentioning
confidence: 96%
“…The breakdown voltages of regular devices in the standard 0.35 µm CMOS technology that the wafer is fabricated in are less than 10 V. To achieve higher pulse voltages, a high-voltage NMOS based on an “Extended Drain” design approach is used [31]. Fig.…”
Section: Single-chip System For Fl-ivusmentioning
confidence: 99%
“…This maximizes the drain current. The structure shown in figure 13(a) also utilizes gate field plates to maximize drain voltage swing as known from Si and SiC power FET technologies [25,26]. Figure 13(b) shows a SEM micrograph of a fabricated recessed gate JFET with gate field plates.…”
Section: Boron Delta-doped Channel Jfetmentioning
confidence: 99%