1998
DOI: 10.1557/proc-512-77
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High Voltage Silicon Carbide Devices

Abstract: Progress made in the development of high performance power rectifiers and switches from silicon carbide are reviewed with emphasis on approaching the 100-fold reduction in the specific on-resistance of the drift region when compared with silicon devices with the same breakdown voltage. The highlights are: (a) Recently completed measurements of impact ionization coefficients in SiC indicate an even higher Baliga's figure of merit than projected earlier. (b) The commonly reported negative temperature co-efficien… Show more

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Cited by 31 publications
(11 citation statements)
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“…This is due to its high critical field for breakdown ($2 MV/cm) and high thermal conductivity ($5 W/cm K) [1][2][3][4][5]. Currently, two commercial growth methods are capable of high growth rates necessary for deposition of bulk crystals or very thick epitaxial layers for ultra high voltage devices.…”
Section: Introductionmentioning
confidence: 99%
“…This is due to its high critical field for breakdown ($2 MV/cm) and high thermal conductivity ($5 W/cm K) [1][2][3][4][5]. Currently, two commercial growth methods are capable of high growth rates necessary for deposition of bulk crystals or very thick epitaxial layers for ultra high voltage devices.…”
Section: Introductionmentioning
confidence: 99%
“…Based on the advantage of the high insulation breakdown electric field, high intrinsic temperature and high thermal conductance of SiC [7] , SiC RSD could get higher blocking voltage for single chip, higher current density and better repetitive frequency performance hopefully.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, because it is an indirect gap material, SiC should have long minority carrier lifetimes, which play an important role in power devices. [1][2][3][4][5][6] However, SiC has many issues that must be resolved prior to insertion into real electronic systems. These include lower than expected minority carrier lifetimes (Ͻ1 µsec); 7,8 the formation of defects during bulk and epitaxial growth, and the formation and propagation of defects during device operation.…”
Section: Introductionmentioning
confidence: 99%