“…The n-type doped layer is formed by doping an electron transporting material with an n-type dopant, such as the alkaline/alkaline-earth metal or the alkaline/alkalineearth compound (e.g., Li 2 CO 3 , Cs 3 PO 4 , Cs 2 CO 3 , CsN 3 , KBH 4 , LiNH 2 ) [4][5][6][7][8]10]. The p-type doped layer is formed by doping a hole transporting material with an electron acceptor having a deep lying unoccupied state, such as tetrafluorotetracyanoquinodimethane (F4-TCNQ), 1,4,5,8,9,11-hexaazatriphenylene hexacarbonitrile (HAT-CN), or the transitional metal oxide (e.g., MoO 3 , WO 3 , V 2 O 5 , etc.)…”