2019
DOI: 10.1016/j.ijmachtools.2019.103431
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Highly efficient planarization of sliced 4H–SiC (0001) wafer by slurryless electrochemical mechanical polishing

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Cited by 60 publications
(24 citation statements)
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“…In addition, SiO 2 peak disappeared from the laser-grinded surface. The result proved that the oxide layer is SiO 2 [ 23 , 24 ].…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In addition, SiO 2 peak disappeared from the laser-grinded surface. The result proved that the oxide layer is SiO 2 [ 23 , 24 ].…”
Section: Resultsmentioning
confidence: 99%
“…In addition, SiO 2 peak disappeared from the laser-grinded surface. The result proved that the oxide layer is SiO 2 [23,24]. XPS analysis was used to identify the chemical nature of the single-crystal silicon wafer surface before and after surface modification.…”
Section: Effect Of Laser Grinding On Microstructure Evolutionmentioning
confidence: 99%
“…The oxidation depth is about 2 µm according to the cross-sectional view along 1−2. Therefore, we can calculate that the material removal rate (MRR) of PEP-MP is about 21.8 µm/h, while the maximum MRR of other single-crystal 4H-SiC polishing technology is about 23 µm/h in Yang's [39] research, who use ECMP for the sliced single-crystal 4H-SiC planarization. The MRR of PEP-MP for BN-abrasive-lapped single-crystal 4H-SiC is close to the maximum MRR of ECMP for the sliced single-crystal 4H-SiC, but it is much bigger than the maximum MRR (3.62µm/h) of ECMP for the diamond-abrasive-lapped single-crystal 4H-SiC [14].…”
Section: Resultsmentioning
confidence: 99%
“…It is based on the alternating effect of chemical reaction and mechanical removal to obtain ultra-precision polished SiC surfaces. Many approaches based on CMP have been made to polishing SiC wafers for smooth surfaces, notable among them electrochemical mechanical polishing (ECMP), 9,10 electrical enhanced photocatalysis polishing, 11 ultraviolet photocatalysis-assisted polishing, 12 and UV-photocatalysis assisted chemical mechanical polishing. 13 However, all the above polishing brings enormous difficulties obtaining atomically at smooth surface without subsurface damages.…”
Section: Introductionmentioning
confidence: 99%