Highly Ordered Good Crystalline ZnO-Doped WO3 Thin Films Suitable for Optoelectronic Applications

Abstract

Highly ordered ZnO doped WO3 thin films with good crystalline quality are prepared using RF magnetron sputtering technique and its structural and morphological properties are studied using various characterisation tools such as XRD, micro-Raman, XPS, FESEM and EDX analysis. X-ray diffraction studies reveal the enhancement of crystalline quality of the films with increase in ZnO doping concentration up to 5 wt%, beyond which the crystalline quality gets deteriorated. A phase modification from single monoclinic WO3 phase to a mixed monoclinic WO3 and W18O49 phases is observed for films with higher ZnO doping concentrations. Morphological analysis shows that a smooth surface for pure film whereas the ZnO doped films presents a dense distribution of grains of larger sizes with well-defined grain boundary.

An Operando X-ray Absorption Spectroscopy Study on Sensing Characteristics of Vertically Aligned ZnO Thin Film for Methane Gas Sensors

“…Additionally, the detection response of the ZnObased gas sensor is significantly affected by operating temperature and gas concentration. Many techniques for the preparation of ZnO nanostructures have been developed, and they are classified as physical and chemical methods such as pulsed laser deposition, magnetron sputtering, electrodeposition, microwave-assisted technique, electron beam evaporation, hydrothermal process, sol-gel methods, chemical vapor deposition, spray pyrolysis, and precipitation [8][9][10][11][12][13]. While the structural and morphological properties of nanomaterials play a vital role in device performance, the design of nanomaterials is a major concern when considering technological applications.…”