“…Currently various heat-resistant substrates such as Pyrex glass [16,17,45,66], fused silica [51], transparent conductive oxide (TCO) [67][68][69][70][71], quartz [46], stainless steel [72][73][74], Ti foil [50], and silicon [15,75,76] have been employed for film deposition. The nature of coating substrates, particularly the surface roughness, has found to exert an influence on the mesostructural regularity of the mesoporous TiO 2 films [77].…”