Highly sensitive positive-working molecular resist based on new molecule

Abstract

Articles you may be interested inEffect of length on the position of negative differential resistance and realization of multifunction in fused oligothiophenes based molecular device J. Chem. Phys. 138, 074307 (2013); 10.1063/1.4790805High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists A highly sensitive positive-working molecular resist based on a new molecule, 1,3,5-tris͓p-͑p-hydroxyphenyl͒-phenyl͔benzene ͑THTPPB͒, was designed and synthesized. THTPPB showed a high glass transition temperature ͑T g ͒ of 145°C. Some acid-leaving groups were attached to THTPPB to realize positive-working performance developed by an alkaline aqueous developer. 70 nm line-and-space ͑1:1͒ positive tone pattern was fabricated with high sensitivity ͑ Ͻ 1 C / cm 2 ͒ by the exposure to a low-energy electron beam ͑5 keV͒.