2004
DOI: 10.1016/j.diamond.2004.01.031
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Highly sensitive UV photodetectors fabricated using high-quality single-crystalline CVD diamond films

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Cited by 74 publications
(28 citation statements)
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“…4,5 A great effort is also being devoted to produce devices from synthetic single crystal diamond (SCD) films grown by homoepitaxial chemical vapor deposition (CVD) onto low-cost SCD substrates. 6,7 Different photodetector structures based on CVD diamond have been reported by several research groups. 8,9 A promising approach is to use a Schottky photodiode (PD) in a multilayered transverse configuration due to its low leakage current, low noise level, zero-bias operation, no signal due to secondary electrons, fast response time, and good responsivity.…”
Section: Introductionmentioning
confidence: 99%
“…4,5 A great effort is also being devoted to produce devices from synthetic single crystal diamond (SCD) films grown by homoepitaxial chemical vapor deposition (CVD) onto low-cost SCD substrates. 6,7 Different photodetector structures based on CVD diamond have been reported by several research groups. 8,9 A promising approach is to use a Schottky photodiode (PD) in a multilayered transverse configuration due to its low leakage current, low noise level, zero-bias operation, no signal due to secondary electrons, fast response time, and good responsivity.…”
Section: Introductionmentioning
confidence: 99%
“…As a wide band gap semiconductor with properties such as low dark current, fast response time, high carrier mobility, good radiation resistance, and bio-compatibility, diamond has drawn much attention recently in the field of ionization radiation detection [1][2][3] for UV, 4 gamma-ray, 5 X-ray, 6,7 neutrons, [8][9][10] protons 11 and heavy ions, 12 especially in Large Hadron Collider accelerator. Diamond detector shows advantages in low dark current and good radiation resistance.…”
Section: Introductionmentioning
confidence: 99%
“…Diamond, thanks to its overwhelming electrical, mechanical and chemical properties, offers important perspectives for electrical [1][2][3][4] and optical [5][6][7] applications. Meanwhile, some features such as the non uniform film thickness or surface roughness obtained after crystal growth by chemical vapour deposition (CVD) are limiting factors for these applications.…”
Section: Introductionmentioning
confidence: 99%