“…However, this method can only be arranged regularly along the substrate surface, which is a challenge for the arbitrary design and composite patterns. , Nanoimprinting is also a mass-productive and high-resolution method, but it is difficult to become a general method as a result of the limitation of imprinting on flexible materials, such as polymers. Otherwise, it is susceptible to be damaged during the transfer process. ,, Although focused electron or ion beam lithography enables the preparation of complex, high-precision structures, the fabrication is often confined within a very small scale as a result of the limitations of complicated procedures and high cost, leading to the structural color observation usually with the help of a microscope. , In contrast to the aforementioned situations, the recent years of ultrafast laser manufacturing development strongly demonstrates its unique advantages in the structural color fabrication, showing a flexible, one-step, and contactless procedure and remarkably suitability for a wide scope of materials. ,− The direct laser writing process is a prominent fabrication method, producing nanostructures that are often featured with high resolution, ,− and suitable for integration applications, such as optical storage. However, although a tight focus of the laser beam can act as a “pensile” to have a micro- or nanoscale fabrication in a mask-free and flexible way, the point-by-point processing still makes it confined, especially in work efficiency. , The spatial light modulator (SLM) has been used by many research groups for ultrafast laser manufacturing with more efficiency. , However, during such SLM-assisted laser processing, a tight focus of the laser beam spot was often demonstrated, which still limits its capability for further improvements.…”