2000
DOI: 10.1109/16.822265
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Hot electron effects on Al/sub 0.25/Ga/sub 0.75/As/GaAs power HFET's under off-state and on-state electrical stress conditions

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Cited by 33 publications
(12 citation statements)
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“…Consequently, the nominal drain-gate (as well as the source-gate) distance is 2.15 m for the 0.7 m devices and 2.375 m for the 0. 25 Fig. 2 shows the output characteristics of both a 0.7 m and a 0.25 m HFET.…”
Section: Devices and Experimentsmentioning
confidence: 99%
“…Consequently, the nominal drain-gate (as well as the source-gate) distance is 2.15 m for the 0.7 m devices and 2.375 m for the 0. 25 Fig. 2 shows the output characteristics of both a 0.7 m and a 0.25 m HFET.…”
Section: Devices and Experimentsmentioning
confidence: 99%
“…According to the literature, this stress is responsible of a positive shift of the threshold voltage, degradation of the transconductance and the drain current, increase of source and drain series resistance [32][33][34]. This is in total accordance with the increase of the knee voltage which could be attributed to the degradation of the ohmic contacts.…”
Section: Resultsmentioning
confidence: 62%
“…It is generally believed that a direct correlation exists between the breakdown voltage stability and the reliability [1]. Indeed, when the devices are operating close to breakdown, the MESFETs and PHEMTs might present degradations due to hot electrons [2,3,4,5,6,7,8]. Worse yet, device reliability for new applications is not predictable until extensive life tests are performed [3].…”
Section: Introductionmentioning
confidence: 97%