2007
DOI: 10.1039/b710241k
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Hot filament chemical vapour deposition of diamond ultramicroelectrodes

Abstract: The hot filament chemical vapour deposition of boron-doped diamond was optimised for the fabrication of diamond ultramicroelectrodes. Applications of ultramicroelectrodes require thin, conformal and non-porous diamond coatings, which display electrochemical properties similar to those associated with good quality doped diamond electrodes. The growth conditions to attain these goals are elucidated. The influence of the use of nanodiamond ultrasonic seeding prior to growth, in order to promote nucleation, and va… Show more

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Cited by 13 publications
(7 citation statements)
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“…Boron doping was introduced by bubbling the hydrogen through an ice-cooled bubbler containing trimethylborate (99%, Aldrich). A negative electrical bias of −60 V was applied throughout the growth to improve the diamond morphology, and full details of the optimal growth conditions for this application are discussed elsewhere …”
Section: Methodsmentioning
confidence: 99%
See 2 more Smart Citations
“…Boron doping was introduced by bubbling the hydrogen through an ice-cooled bubbler containing trimethylborate (99%, Aldrich). A negative electrical bias of −60 V was applied throughout the growth to improve the diamond morphology, and full details of the optimal growth conditions for this application are discussed elsewhere …”
Section: Methodsmentioning
confidence: 99%
“…A negative electrical bias of -60 V was applied throughout the growth to improve the diamond morphology, and full details of the optimal growth conditions for this application are discussed elsewhere. 26 The diamond-coated tungsten needles were insulated with cathodic electrophoretic paint for insulation. The diamond electrode was used as cathode and a platinum coil was used as anode.…”
Section: +mentioning
confidence: 99%
See 1 more Smart Citation
“…A specialized CVD reactor, based on the known method of "hot filaments" [14,15], was used to deposit the films. In this method, the activation of the gas mixture (H 2 :CH 4 ) is carried out thermally, by means of incandescent tungsten filaments.…”
Section: Deposition Of Diamond Filmsmentioning
confidence: 99%
“…By introducing boron in the usual methane-hydrogen gas chemistry of CVD diamond, a first layer of this material is grown on top of a tungsten sharp wire. The choice for tungsten relies in its ability to form an electrically conductive carbide interlayer that precedes the nucleation of diamond crystals 14 . Moreover, being the metal with highest melting point it is perfectly suitable for the relatively high temperatures used for the CVD technique, usually in the range of 500-1000 ºC.…”
Section: Electrochemical Measurementsmentioning
confidence: 99%