“…Gallium nitride (GaN), as a Group III nitride semiconductor material, has been widely used for optoelectronic device applications, such as light emitting diodes [ 1 , 2 , 3 ], high electron mobility transistors [ 4 , 5 ], semiconductor lasers [ 6 , 7 ], solar cells [ 8 , 9 ], and ultraviolet detectors [ 10 , 11 ], due to its advantages of wide direct band gap, high carrier concentration, high breakdown field strength, and excellent chemical durability [ 12 ]. GaN thin films can be grown using pulsed laser deposition [ 13 , 14 ], magnetron sputter epitaxy [ 15 , 16 ], molecular beam epitaxy [ 17 , 18 ], metal-organic chemical vapor deposition [ 19 , 20 ], and atomic layer deposition (ALD) [ 21 , 22 ].…”