2013
DOI: 10.1016/j.surfcoat.2013.07.003
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Hybrid HIPIMS and DC magnetron sputtering deposition of TiN coatings: Deposition rate, structure and tribological properties

Abstract: Abstract:High power impulse magnetron sputtering (HIPIMS) has the advantage of ultra-dense plasma deposition environment although the resultant deposition rate is significantly low. By using a closed field unbalanced magnetron sputtering system, a hybrid process consisting of one HIPIMS powered magnetron and three DC magnetrons has been introduced in the reactive sputtering deposition of a TiN hard coating on a hardened steel substrate, to investigate the effect of HIPIMS incorporation on the deposition rate a… Show more

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Cited by 83 publications
(33 citation statements)
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“…45 HIPIMS/DCMS co-sputtering has also been investigated for obtaining a higher ionization degree of sputtered species without significant loss of deposition rate. 46,47,48 In Sec. II, we discuss the results of energy-analyzed mass spectrometry measurements performed to determine ion-energy distribution functions (IEDFs) at the substrate position for Al and Ti targets operated in HIPIMS and DCMS.…”
Section: Introductionmentioning
confidence: 99%
“…45 HIPIMS/DCMS co-sputtering has also been investigated for obtaining a higher ionization degree of sputtered species without significant loss of deposition rate. 46,47,48 In Sec. II, we discuss the results of energy-analyzed mass spectrometry measurements performed to determine ion-energy distribution functions (IEDFs) at the substrate position for Al and Ti targets operated in HIPIMS and DCMS.…”
Section: Introductionmentioning
confidence: 99%
“…Details of the structural characterization and mechanical properties of the sample coating can be found elsewhere [26]. In brief, the coating was 2.56 µm thick, exhibiting a single-phase cubic crystalline structure with a strong {220} texture and hardness of HK 0.025 34.8 ± 3.8 GPa.…”
Section: The Sample Materialsmentioning
confidence: 99%
“…Fig. 1 shows a schematic section of the configuration, which could be operated either as a conventional multimagnetron close-field unbalanced magnetron sputtering ion plating (CFUBMSIP) system or without any magnetrons [34,38] . The substrate turntable has a diameter of 350 mm with single fold rotation.…”
Section: The High Power Pulsed Glow Discharge Plasma Nitriding Processmentioning
confidence: 99%
“…The wear resistance of the processed samples was evaluated using a self-developed pin-on-disc tribo-meter [34,38,40] .In the tests, two counterpart materials were used, including 5.0 mm diameter balls made from hardened Cr-alloyed ball bearing steel and WC-8%Co cemented carbide. The wear tests were conducted under an applied normal load of 5 N and linear sliding speed of 0.2 ms -1 , with each test being run for 60 minutes.…”
Section: Hardness and Tribological Testingmentioning
confidence: 99%