An electrically pumped 1.3 μm room‐temperature InAs/GaAs quantum dot laser on a Si substrate has been demonstrated with a threshold current density of 360 A/cm2. The double‐hetero laser structure was grown on a GaAs substrate by metal‐organic chemical vapor deposition and layer‐transferred onto a Si substrate by GaAs/Si wafer bonding mediated by a 380‐nm‐thick Au‐Ge‐Ni alloy layer. We have demonstrated that insertion of a metal thin film in a wafer‐bonded GaAs/Si interface enhances interfacial electrical conductivity and suppresses optical leakage from the laser cavity into the substrate and therefore is suitable for III‐V‐on‐Si hybrid laser applications. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)