“…Half-metallic Fe 3 O 4 is of great current interest as a RT spin injector due to its predicted half-metallicity, 8 strong measured spin polarization approaching 100% at E F , 9 and high T C of 858 K, well in excess of RT. To date, epitaxial growth of Fe 3 O 4 films on a variety of conventional semiconductors, such as GaAs, 10,11 InAs, 12 and Si, 13 has been achieved, whereas possible growth on wide bandgap semiconductors, such as GaN, a technologically important material for fabrication of optoelectronic devices, 14,15 and high power transistors, 16 remains essentially unexplored. Recent GaN-based spin relaxation measurements yield spin lifetimes of ϳ20 ns at 5 K. 17 Theoretical calculations predicted that the spin lifetime in pure GaN is about three orders of magnitude larger than in GaAs for all temperatures.…”