Epitaxial Growth of Complex Metal Oxides 2015
DOI: 10.1016/b978-1-78242-245-7.00003-8
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Hybrid molecular beam epitaxy for the growth of complex oxide materials

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“…19,44,45 The STO layer thickness, described in number of SrO layers, was verified using cross-sectional scanning transmission electron microscopy (STEM).…”
Section: Methodsmentioning
confidence: 99%
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“…19,44,45 The STO layer thickness, described in number of SrO layers, was verified using cross-sectional scanning transmission electron microscopy (STEM).…”
Section: Methodsmentioning
confidence: 99%
“…SmTO/STO/SmTO quantum well samples were grown by hybrid MBE on commercial LSAT substrates, as reported elsewhere. 19,44,45 The STO layer thickness, described in number of SrO layers, was verified using cross-sectional scanning transmission electron microscopy (STEM). Devices for transport measurements (Hall bars and mesa samples) were fabricated from the as-grown QWs by a combination of e-beam and photolithography to define contacts for metallization (e-beam evaporation of 5 nm Ti and 50 nm Au), followed by room-temperature directional reactive ion etching (RIE) with chlorine to isolate welldefined regions of QW sample for study.…”
Section: Methodsmentioning
confidence: 99%
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